Výsledky vyhledávání - "Masatoshi Echigo"

EUV sensitizer for resists and spin-on-carbon materials

Autor: Makinoshima Takashi, Sachiko Shinjo, Toida Takumi, Masatoshi Echigo, Yuta Togashi, Takashi Sato

Publikováno v: International Conference on Extreme Ultraviolet Lithography 2018.

We are developing the EUV sensitizer for resists and Spin-on-Carbon materials. In previous report, we reported that we had developed the novel materials containing the iodine having high EUV absorption ability, and EUV absorption rate proved to be ca

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::cba544acb60b6518f301a8edb1d5c9d0
https://doi.org/10.1117/12.2323096

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Development of new polyphenols applied to spin-on carbon hardmask with characteristics of high-heat resistance and good planarization

Autor: Masayoshi Ueno, Takashi Sato, Masatoshi Echigo, Yasushi Miki, Makinoshima Takashi, Koichi Yamada, Horiuchi Junya

Publikováno v: Advances in Patterning Materials and Processes XXXV.

We had developed various Polyphenols and Xanthene derivatives such as NF7177C and NF0197 which showed high heat resistance. In this paper, we reported on new mareimide derivatives named “NeoFARIT N0XX (NFN0XX)” series which showed the highest hea

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0e0a8ef29d2bbcdbff60b7e25018d3ba
https://doi.org/10.1117/12.2297289

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Development of the negative-tone molecular resists for EB/EUVL having high EUV absorption capacity and molecular design method

Autor: Takashi Sato, Hiroto Kudo, Yuta Togashi, Tetsuo Harada, Takeo Watanabe, Masatoshi Echigo, Toida Takumi, Takigawa Tomoaki

Publikováno v: International Conference on Extreme Ultraviolet Lithography 2017.

In this paper, we designed the synthesis of negative-type molecular resist materials for EB and EUVL exposure tools, and their properties were examined. The resist materials for EUVL have been required showing higher sensitivity for high throughput i

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::93489bdd3c8be90fcc7abc5da77dbec3
https://doi.org/10.1117/12.2280514

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Development of high heat resistant polyphenols applied to the spin-on carbon hardmask

Autor: Masatoshi Echigo, Takashi Sato, Yoko Shimizu, Okada Kana, Horiuchi Junya, Makinoshima Takashi, Takigawa Tomoaki, Naoya Uchiyama

Publikováno v: SPIE Proceedings.

In this paper, we report on new polyphenols synthesized by the condensation compounds of phenols and aldehydes. The phenols were 4,4'-biphenol, 2,6-dihydroxynaphthalene and 2,7-dihydroxynaphthalene. The aldehydes were 4- phenylbenzaldehyde and 4,4'-b

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::7201faa0fbb33d559b3ef30e343ab243
https://doi.org/10.1117/12.2257975

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Development of heat resistant polyphenol compounds applied to the spin-on carbon hardmask

Autor: Horiuchi Junya, Okada Kana, Yoko Shimizu, Takashi Satou, Masatoshi Echigo, Makinoshima Takashi

Publikováno v: SPIE Proceedings.

In this paper, we report the development of a new polyphenol, NF7177, applied to the Spin-On Carbon Hardmask and the thermosetting properties. The new polyphenol derivatives were easily synthesized by the condensation of aldehydes and dihydroxybiphen

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ac20442d674fe7b0d2e3ef39746d5f6d
https://doi.org/10.1117/12.2218946

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