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pro vyhledávání: '"Masato Shigematu"'
Autor:
Yasuyuki Nakajima, Shigeo Irie, Kiyoshi Fujii, Ken-Ichi Mizusawa, Takahiro Kishioka, Rikimaru Sakamoto, Masato Shigematu
Publikováno v:
Journal of Photopolymer Science and Technology. 17:665-670
We developed NCA660 as a bottom-antireflective-coating (BARC) for 157-nm lithography last year. The NCA660 characteristics, such as the k-value, dry-etching rate, and film thickness loss, were optimized to meet the target for 157-nm lithography. In t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::134ffd0bd1d9f12b09259334b219be04
https://doi.org/10.2494/photopolymer.17.665
https://doi.org/10.2494/photopolymer.17.665
