Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Masatashi Oda"'
Publikováno v:
Microelectronic Engineering. 13:251-254
X-ray masks with four sub-half-micron 1M-DRAM chips have been fabricated for four lithography levels. A four-level mask-to-mask overlay accuracy of higher than 0.13 μm (3σ) was obtained. In these masks, the distance between chip boundaries and wind
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2508bd782b81069fac2d5369a6fe5b0b
https://doi.org/10.1016/0167-9317(91)90086-s
https://doi.org/10.1016/0167-9317(91)90086-s
