Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Masashi Nishiki"'
Publikováno v:
Journal of Thermal Spray Technology. 23:1333-1338
Aerosol deposition method is a technique to form dense films by impacting solid particles on a substrate at room temperature. To clarify the bonding mechanism between AD films and substrates, TEM observation and electron energy-loss spectroscopy (EEL
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c9778efea6d2a89e60666d4ef8e6b61f
https://doi.org/10.1007/s11666-014-0172-4
https://doi.org/10.1007/s11666-014-0172-4
Publikováno v:
Journal of Thermal Spray Technology. 22:1267-1274
Aerosol deposition method (ADM) is a technique to form dense films by impacting solid particles to a substrate at room temperature. To improve the deposition efficiency in ADM, the relationship between the impact velocity of Al2O3 particles and the d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54a2dde051428b5e76feab263fb9d651
https://doi.org/10.1007/s11666-013-0031-8
https://doi.org/10.1007/s11666-013-0031-8
Publikováno v:
Journal of Photopolymer Science and Technology. 8:329-332
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::863218abc5a0555ddf6010cc81f533c2
https://doi.org/10.2494/photopolymer.8.329
https://doi.org/10.2494/photopolymer.8.329
Publikováno v:
Nihon Hotetsu Shika Gakkai Zasshi. 25:288-294
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07566b133e7637d049fe2e27c1227b3e
https://doi.org/10.2186/jjps.25.288
https://doi.org/10.2186/jjps.25.288
Publikováno v:
Polymer Engineering and Science. 29:856-858
A novel positive resist was prepared by sensitizing poly(p-trimethylsilyloxystyrene) with p-nitro-benzyl-9, 10-diethoxyanthracene-2-sulfonate (NBAS) which was found to be a deep UV bleachable acid precursor. The silylated polymer is converted to alka
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b0d0c2006bfee80e1c4189e56b11c323
https://doi.org/10.1002/pen.760291305
https://doi.org/10.1002/pen.760291305
Publikováno v:
Japanese Journal of Applied Physics. 28:2126
It was found that aromatic sulfonamides offer a novel category of photosensitive compounds for negative resists. A photosensitive layer consisting of m-cresol novolak resin and an aromatic sulfonamide such as p-(tolyl sulfonyl)-aniline, benzene sulfo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4b3293ba970456ed22a25c8460e327db
https://doi.org/10.1143/jjap.28.2126
https://doi.org/10.1143/jjap.28.2126
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Conference
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