Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Masashi Ataka"'
Seamless long line and space pattern fabrication for nanoimprint mold by using electron beam stepper
Publikováno v:
Microelectronic Engineering. 88:2074-2078
Nanoimprint lithography (NIL) is a simple process to fabricate nanostructure devices with high throughput and low cost. The mold fabrication process is an important factor to improve NIL technology. Adopting a seamless pattern mold fabrication proces
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::461800f2ffe5e7a1a5a777df0ccb84f7
https://doi.org/10.1016/j.mee.2011.02.105
https://doi.org/10.1016/j.mee.2011.02.105
Autor:
Makoto Okada, Kaori Yanagihara, Takashi Kishiro, Norimichi Anazawa, Shinji Matsui, Masashi Ataka
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28:740-743
The nanoimprint molds are usually fabricated by electron beam (EB) lithography. In recent years, a large-area mold fabrication with a high throughput is required to use nanoimprint lithography to produce devices in mass production. Using a convention
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::76877cb2eaf9c726c8a82e1313c320ac
https://doi.org/10.1116/1.3449270
https://doi.org/10.1116/1.3449270
Autor:
Masashi Ataka, Norimichi Anzawa, Makoto Okada, Shinji Matsui, Kaori Yanagihara, Takashi Kishiro
Publikováno v:
Journal of Photopolymer Science and Technology. 23:75-78
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ee41e6a9e307ad01965502c0a84f04d3
https://doi.org/10.2494/photopolymer.23.75
https://doi.org/10.2494/photopolymer.23.75
Publikováno v:
SPIE Proceedings.
The optical inspection system has been applied for mask inspection. The small but fatal detects on the mask can not be detected minutely by the optical system because of the limitations of optical resolution. We have developed the Defect Imaging Syst
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec42e949f7dc368a8607164f17473ff9
https://doi.org/10.1117/12.694530
https://doi.org/10.1117/12.694530
Publikováno v:
SPIE Proceedings.
For evaluation of high-end photomasks for under 65 nm design rule wafers, Holon has developed EMU-Navi, optional software for Holon EMU-series mask Critical Dimension Scanning Electron Microscope (CD-SEM), which helps automated and accurate CD measur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3615477d72ddb305e601c1c7bfdeb08d
https://doi.org/10.1117/12.632000
https://doi.org/10.1117/12.632000
Autor:
Hitomi Satoh, Izumi Santo, Masashi Ataka, Katsuyuki Takahashi, Naoyuki Nakamura, Norimichi Anazawa, Yasunobu Kitayama
Publikováno v:
SPIE Proceedings.
Recently, in Critical Dimension (CD) measurement on high-end masks, Optical Proximity Correction (OPC) pattern measurement is on increase and it has become important to measure angled lines. In CD searching on a CAD layout viewer, the exact CD values
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e4a76a0f2ecf952e7e08dd8f0275f20
https://doi.org/10.1117/12.632016
https://doi.org/10.1117/12.632016
Publikováno v:
SPIE Proceedings.
Rapid changes in the feature size of photo masks have made it clear that there is an obvious limitation to the use of optical measurement tools, and mask makers now have the necessity to use CD-SEMs as a measurement tool for forefront patterns. The l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::abd9520e26a9f964d26b8e910d766a73
https://doi.org/10.1117/12.468088
https://doi.org/10.1117/12.468088
Publikováno v:
SPIE Proceedings.
We evaluated an advanced CD-SEM as a photomask CD guarantee tool. Measurement repeatability was 2.3 nm (3 (sigma) ) for each measurement, and reproducibility (the range of average value in 5 days) is 3 nm. Contamination effect was evaluated by measur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e9b39511cf6046994c34d379d21afba6
https://doi.org/10.1117/12.332868
https://doi.org/10.1117/12.332868
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 19:1264
Advanced critical dimension (CD)-scanning electron microscope was evaluated as a photomask CD guarantee tool. Measurement repeatability was 2.3 nm (3σ) for each measurement, and reproducibility (range of average value in five days) was 3 nm. The con
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::112071b707663515d43e5aed7769a94b
https://doi.org/10.1116/1.1381064
https://doi.org/10.1116/1.1381064
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