Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Masaru Tomono"'
Autor:
Hideo Nakashima, Yuichi Yoshida, John S. Petersen, Cong Que Dinh, Balint Meliorisz, Geert Vandenberghe, Philippe Foubert, Kosuke Yoshihara, Kathleen Nafus, Hans-Jürgen Stock, Masaru Tomono, Yuya Kamei, Seiji Nagahara, Michael A. Carcasi, Ryo Shimada, Yoshihiro Kondo, Danilo De Simone, Yukie Minekawa, Peter De Bisschop, Gosuke Shiraishi, Hiroyuki Ide, Serge Biesemans, Kazuhiro Takeshita
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
Resist Formulation Optimizer (RFO) is created to optimize resist formulation under EUV stochastic effects. Photosensitized Chemically Amplified ResistTM (PSCARTM) 2.0 reaction steps are included in the resist reaction model in RFO in addition to stan
Autor:
Hans-Jürgen Stock, Yuya Kamei, Serge Biesemans, Yoshihiro Kondo, Hiroyuki Ide, Ryo Shimada, Yukie Minekawa, Philippe Foubert, Kazuhiro Takeshita, Kosuke Yoshihara, Kathleen Nafus, Geert Vandenberghe, Michael A. Carcasi, Yuichi Yoshida, Peter De Bisschop, Masaru Tomono, Gousuke Shiraishi, Seiji Nagahara, John S. Petersen, Balint Meliorisz, Danilo De Simone, Teruhiko Moriya, Cong Que Dinh
Publikováno v:
Extreme Ultraviolet (EUV) Lithography X.
Photosensitized Chemically Amplified ResistTM (PSCARTM) has been demonstrated as a promising solution for a high sensitivity resist in EUV lithography mass production. This paper describes the successful calibration of a PSCAR resist model for deploy
Autor:
Akihiro Oshima, Seiichi Tagawa, Hiroyuki Ide, Serge Biesemans, Kosuke Yoshihara, Yoshitaka Konishi, Danilo De Simone, Masafumi Hori, Teruhiko Moriya, Hayakawa Makoto, Hans-Jürgen Stock, Yuya Kamei, Kathleen Nafus, Ryo Aizawa, Ken Maruyama, Takahiro Shiozawa, Yoshihiro Kondo, Motoyuki Shima, Kazuhiro Takeshita, Michael A. Carcasi, Masashi Enomoto, Toru Kimura, Yukie Minekawa, Tomoki Nagai, Gosuke Shiraishi, Hideo Nakashima, Masayuki Miyake, Hisashi Nakagawa, Geert Vandenberghe, Keisuke Yoshida, Masaru Tomono, John S. Petersen, Balint Meliorisz, Takehiko Naruoka, Ryo Shimada, Seiji Nagahara, Satoshi Dei, Foubert Philippe
Publikováno v:
Advances in Patterning Materials and Processes XXXV.
Photosensitized Chemically Amplified ResistTM (PSCARTM) **2.0’s advantages and expectations are reviewed in this paper. Alpha PSCAR in-line UV exposure system (“Litho Enhancer”) was newly installed at imec in a Tokyo Electron Ltd. (TELTM)’s C
Autor:
Hideo Nakashima, Geert Vandenberghe, Masafumi Hori, Gosuke Shiraishi, Michael A. Carcasi, Masayuki Miyake, Seiji Nagahara, Hiroyuki Ide, Yuya Kamei, Satoshi Dei, Hisashi Nakagawa, Yukie Minekawa, Kosuke Yoshihara, Kathleen Nafus, Yoshihiro Kondo, Tomoki Nagai, Masaru Tomono, Motoyuki Shima, Philippe Foubert, Kazuhiro Takeshita, Ryo Shimada, John S. Petersen, Serge Biesemans, Takehiko Naruoka, Ken Maruyama, Danilo De Simone, Teruhiko Moriya, Akihiro Oshima, Seiichi Tagawa
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
In order to lower the cost of ownership of EUV lithography, high sensitivity EUV resists , enabling higher throughput of EUV scanners are being explored. The concept that utilizes a Photosensitized Chemically Amplified ResistTM (PSCARTM) is a promisi
Autor:
Geert Vandenberghe, Tomohiro Iseki, Tomoki Nagai, Hisashi Nakagawa, Akihiro Oshima, Michael A. Carcasi, Yoshihiro Kondo, Seiichi Tagawa, Philippe Foubert, Danilo De Simone, Bernd Küchler, Yukie Minekawa, Serge Biesemans, Hans-Jürgen Stock, Takehiko Naruoka, Hideo Nakashima, Yasin Ekinci, Yuya Kamei, Elizabeth Buitrago, Seiji Nagahara, Masafumi Hori, Ryo Shimada, Takahiro Shiozawa, Gosuke Shiraishi, Masaru Tomono, Michaela Vockenhuber, Satoshi Dei, Kosuke Yoshihara, Kathleen Nafus
Publikováno v:
SPIE Proceedings.
A new type of Photosensitized Chemically Amplified Resist (PSCAR) **: “PSCAR 2.0,” is introduced in this paper. PSCAR 2.0 is composed of a protected polymer, a “photo acid generator which can be photosensitized” (PS-PAG), a “photo decomposa
Autor:
Seiji Nagahara, Cong Que Dinh, Gosuke Shiraishi, Yuya Kamei, Nafus, Kathleen, Yoshihiro Kondo, Carcasi, Michael, Yukie Minekawa, Hiroyuki Ide, Yuichi Yoshida, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Biesemans, Serge, Hideo Nakashima, De Simone, Danilo, Petersen, John S., Foubert, Philippe, De Bisschop, Peter
Publikováno v:
Proceedings of SPIE; 1/23/2019, Vol. 10960, p1-15, 15p
Autor:
Cong Que Dinh, Seiji Nagahara, Gousuke Shiraishi, Yukie Minekawa, Yuya Kamei, Carcasi, Michael, Hiroyuki Ide, Yoshihiro Kondo, Yuichi Yoshida, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Teruhiko Moriya, Kazuhiro Takeshita, Nafus, Kathleen, Biesemans, Serge, Petersen, John S., De Simone, Danilo, Foubert, Philippe, De Bisschop, Peter
Publikováno v:
Proceedings of SPIE; 1/20/2019, Vol. 10957, p109571O-1-109571O-10, 10p
EUV resist sensitization and roughness improvement by PSCARTM with in-line UV flood exposure system.
Autor:
Seiji Nagahara, Carcasi, Michael, Gosuke Shiraishi, Yuya Kamei, Nafus, Kathleen, Yukie Minekawa, Hiroyuki Ide, Yoshihiro Kondo, Takahiro Shiozawa, Keisuke Yoshida, Masashi Enomoto, Kosuke Yoshihara, Hideo Nakashima, Serge Biesemans, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Teruhiko Moriya, Makoto Hayakawa, Ryo Aizawa
Publikováno v:
Proceedings of SPIE; 1/14/2018, Vol. 10586, p1-11, 11p
Autor:
Carcasi, Michael, Nagahara, Seiji, Gosuke Shiraishi, Yukie Minekawa, Hiroyuki Ide, Yoshihiro Kondo, Kosuke Yoshihara, Masaru Tomono, Ryo Shimada, Kazuhiro Takeshita, Teruhiko Moriya, Kamei, Yuya, Nafus, Kathleen, Serge Biesemans, Hideo Nakashima, Masafumi Hori, Ken Maruyama, Hisashi Nakagawa, Tomoki Nagai, Satoshi Dei
Publikováno v:
Proceedings of SPIE; 1/11/2018, Vol. 10583, p1-14, 14p
Autor:
Masamichi Matsuzu, Eiichi Nagai, Masaru Tomono, Toshiki Ichiwata, Minoru Nishiyama, Katsuzoh Ohki, Shoichi Miyoshi
Publikováno v:
The Journal of Nihon University School of Dentistry. 25:113-121