Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Masaoki Hirose"'
Autor:
Masaoki Hirose, Shigetoshi Ikeda, Yasushi Aoki, Minoru Iida, Akihiro Oshima, Takanori Katoh, Yoneho Tabata, Yasunori Sato, Daichi Yamaguchi, Masakazu Washio
Publikováno v:
Macromolecular Symposia. 181:201-212
Micromachining of crosslinked PTFE (polytetrafluoroethylene) using synchrotron radiation direct photo-etching method has been demonstrated. High aspect-ratio microfabrication was carried out. The etching rate of crosslinked PTFE was higher than that
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::24f9d5ba554bb4253e1d97128ffb03c8
https://doi.org/10.1002/1521-3900(200205)181:1<201::aid-masy201>3.0.co
https://doi.org/10.1002/1521-3900(200205)181:1<201::aid-masy201>3.0.co
Autor:
Masaoki Hirose
Publikováno v:
The Review of Laser Engineering. 29:653-658
Synchrotron-based proximity x-ray lithography (PXL) has been developed for more than 20 years. The lightsource for high-throughput PXL manufacturing is a synchrotron radiation (SR) ring with multiple x-ray steppers. From the late 1980 's to early 199
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f076d2ff6eccbf7b61f1f69b19570e72
https://doi.org/10.2184/lsj.29.653
https://doi.org/10.2184/lsj.29.653
Autor:
Masaoki HIROSE
Publikováno v:
Journal of the Japan Society for Precision Engineering. 67:1420-1425
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::832f9f53d7032017b6f846ba4e61f47d
https://doi.org/10.2493/jjspe.67.1420
https://doi.org/10.2493/jjspe.67.1420
Publikováno v:
SPIE Proceedings.
We propose a novel alignment method using scattered-light, which has high sensitivity to a silicon carbide x-ray mask without coating antireflection films and opaque film. The scattered-light alignment system is a video-based alignment utilizing the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::16171f29ef818f84024e82b8f9f43a05
https://doi.org/10.1117/12.275780
https://doi.org/10.1117/12.275780
Autor:
Tsutomu Miyatake, Xuan Li, Sayumi Hirose, Masaoki Hirose, Kiyoshi Fujii, Eijiro Toyota, Katsumi Suzuki
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:2986
We have developed a short beamline with high brightness for x-ray lithography. The beamline contains a single, a scanning toroidal mirror and a vacuum-protection system with an acoustic delay line. The practical exposure intensity on a wafer was appr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::887b093014f17e9a6551570ccc0e0f1d
https://doi.org/10.1116/1.1319832
https://doi.org/10.1116/1.1319832
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 16:3471
Previously we described a video-based scattered-light alignment (SLA) system, capable of nanometer-scale alignment accuracy. In order to meet highly accurate alignment with low optical transparency in x-ray masks, we performed the modifications of al
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e97895fcb720fd47713e20cf8fdd9ac
https://doi.org/10.1116/1.590479
https://doi.org/10.1116/1.590479
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 15:2471
The alignment performances of the video-based scattered-light alignment (SLA) system for 0.1 μm lithography are described in this article. The SLA system has high sensitivity to the silicon carbide (SiC) mask without an antireflection coating (ARC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1d1278db32368cca5d5f1cf4e70f4556
https://doi.org/10.1116/1.589669
https://doi.org/10.1116/1.589669