Výsledky vyhledávání - "Masaoki Hirose"

Autor: Masaoki Hirose

Publikováno v: The Review of Laser Engineering. 29:653-658

Synchrotron-based proximity x-ray lithography (PXL) has been developed for more than 20 years. The lightsource for high-throughput PXL manufacturing is a synchrotron radiation (SR) ring with multiple x-ray steppers. From the late 1980 's to early 199

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f076d2ff6eccbf7b61f1f69b19570e72
https://doi.org/10.2184/lsj.29.653

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Autor: Masaoki HIROSE

Publikováno v: Journal of the Japan Society for Precision Engineering. 67:1420-1425

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::832f9f53d7032017b6f846ba4e61f47d
https://doi.org/10.2493/jjspe.67.1420

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Scattered-light alignment system using SiC mask for x-ray lithography

Autor: Ryo Ohkubo, Tsutomu Miyatake, Tsutomu Shoki, Kuniaki Yamazaki, Masaoki Hirose

Publikováno v: SPIE Proceedings.

We propose a novel alignment method using scattered-light, which has high sensitivity to a silicon carbide x-ray mask without coating antireflection films and opaque film. The scattered-light alignment system is a video-based alignment utilizing the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::16171f29ef818f84024e82b8f9f43a05
https://doi.org/10.1117/12.275780

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Performance of a compact beamline with high brightness for x-ray lithography

Autor: Tsutomu Miyatake, Xuan Li, Sayumi Hirose, Masaoki Hirose, Kiyoshi Fujii, Eijiro Toyota, Katsumi Suzuki

Publikováno v: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:2986

We have developed a short beamline with high brightness for x-ray lithography. The beamline contains a single, a scanning toroidal mirror and a vacuum-protection system with an acoustic delay line. The practical exposure intensity on a wafer was appr

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::887b093014f17e9a6551570ccc0e0f1d
https://doi.org/10.1116/1.1319832

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Nanometer scattered-light alignment system using SiC x-ray masks with low optical transparency

Autor: Masaoki Hirose, Tsutomu Miyatake, Ryo Ohkubo, Tsutomu Shoki, Kuniaki Yamazaki

Publikováno v: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 16:3471

Previously we described a video-based scattered-light alignment (SLA) system, capable of nanometer-scale alignment accuracy. In order to meet highly accurate alignment with low optical transparency in x-ray masks, we performed the modifications of al

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https://doi.org/10.1116/1.590479

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Evaluation of alignment accuracy in processed wafers and SiC masks on a scattered-light alignment system for x-ray aligners

Autor: Tsutomu Miyatake, Ryo Ohkubo, Tsutomu Shoki, Masaoki Hirose, Kuniaki Yamazaki

Publikováno v: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 15:2471

The alignment performances of the video-based scattered-light alignment (SLA) system for 0.1 μm lithography are described in this article. The SLA system has high sensitivity to the silicon carbide (SiC) mask without an antireflection coating (ARC).

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1d1278db32368cca5d5f1cf4e70f4556
https://doi.org/10.1116/1.589669

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