Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Masao Mutou"'
Autor:
Hiroshi Kawase, Motohiro Furuki, Masanobu Yamamoto, Masao Mutou, Minoru Takeda, Yuichi Aki, Toshiaki Miyokawa, Masataka Shinoda, Kimihiro Saito, Mitsuru Koizumi
Publikováno v:
SPIE Proceedings.
We have demonstrated the capability of 100GB density recording by the electorn beam mastering and Si etching process optimization.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::71b5b5d0c203dc0d6d004f2c9ae1cbc1
https://doi.org/10.1117/12.533039
https://doi.org/10.1117/12.533039
Autor:
Motohiro Furuki, Minoru Takeda, Masanobu Yamamoto, Masataka Shinoda, Kimihiro Saito, Yuichi Aki, Hiroshi Kawase, Mitsuru Koizumi, Toshiaki Miyokawa, Masao Mutou
Publikováno v:
Optical Data Storage.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d27a92a6b67e864fee58f07718c46dbd
https://doi.org/10.1364/ods.2003.md4
https://doi.org/10.1364/ods.2003.md4
Autor:
Minoru Takeda, Yuichi Aki, Mitsuru Koizumi, Masanobu Yamamoto, Hiroshi Kawase, Motohiro Furuki, Kimihiro Saito, Toshiaki Miyokawa, Masataka Shinoda, Masao Mutou
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 3:545
We demonstrate the capability of 100-GB density recording by electron beam mastering and readout by a near-field optical pickup with an effective NA of 2.05 and a blue LD of 405-nm wavelength. A silicon (Si) disk of 100-GB density is fabricated by an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::426760127bcc8aa940c136282104eef5
https://doi.org/10.1117/1.1793154
https://doi.org/10.1117/1.1793154
Autor:
Yuichi Aki, Mitsuru Koizumi, Kimihiro Saito, Motohiro Furuki, Hiroshi Kawase, Masao Mutou, Masataka Shinoda, Toshiaki Miyokawa, Nobuo Handa, Minoru Takeda, Masanobu Yamamoto
Publikováno v:
Japanese Journal of Applied Physics. 43:5044
We developed an electron beam recorder (EBR) capable of recording master discs under atmospheric conditions using a novel differential pumping head. Using the EBR and optimized fabrication process for Si-etched discs with reactive ion etching (RIE),
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6b4e13daa6cf68aad10a62e29ae69a85
https://doi.org/10.1143/jjap.43.5044
https://doi.org/10.1143/jjap.43.5044