Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Masanobu Higashide"'
Publikováno v:
Asian Journal on Quality. 13:37-52
Purpose – This paper aims to clarify adequate control characteristics for using a control chart on the basis of a case study of the low‐pressure chemical vapor deposition (LPCVD) process, which is one of the semiconductor manufacturing processes.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::194d0683be4b136dce059dd5e48d077c
https://doi.org/10.1108/15982681211237815
https://doi.org/10.1108/15982681211237815
Publikováno v:
Frontiers in Statistical Quality Control 10 ISBN: 9783790828450
This paper is developed from Higashide et al. (Front Stat Qual Control 9:71–84, 2010). Automatic process control (APC) is frequently used in the semiconductor manufacturing process; however, statistical process control (SPC) is also needed to contr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a74604da23167ea6b3c4dafa7caf95dc
https://doi.org/10.1007/978-3-7908-2846-7_8
https://doi.org/10.1007/978-3-7908-2846-7_8
Publikováno v:
Frontiers in Statistical Quality Control 9 ISBN: 9783790823790
This paper considers statistical process control (SPC) for the semiconductor manufacuturing industry, where automatic process adjustment and process maintenance are widely used. However, SPC has been developed in parts industry an, thus, application
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1edeebdd6149e087ac3d10aeee66ee9a
https://doi.org/10.1007/978-3-7908-2380-6_5
https://doi.org/10.1007/978-3-7908-2380-6_5
Publikováno v:
Langmuir. 7:51-55
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1badf817f88a7ba969e96da769f079db
https://doi.org/10.1021/la00049a012
https://doi.org/10.1021/la00049a012