Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Masanao Fukuda"'
Autor:
Takafumi Sasaki, Takahiro Daikoku, Kazuhiro Morimitsu, Masanao Fukuda, Kazushige Kikuta, Takemi Chikahisa, Takao Hishinuma
Publikováno v:
TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series B. 73:1599-1605
The paper investigates the method of improving deposition rate in semiconductor deposition process, while maintaining film thickness uniformity and step coverage in a vertical LPCVD (Low-Pressure Chemical Vapor Deposition) system. In general increasi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6ae229e1a956ef3b86a19f5525d20410
https://doi.org/10.1299/kikaib.73.1599
https://doi.org/10.1299/kikaib.73.1599
Publikováno v:
TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C. 64:1668-1675
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b195981163b5f15083acfa468be34856
https://doi.org/10.1299/kikaic.64.1668
https://doi.org/10.1299/kikaic.64.1668