Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Masami Yonekawa"'
Autor:
Masami Yonekawa, Chris E. Jones, Yukio Takabayashi, Jin Choi, Kazuki Nakagawa, Ali Aghili, Hisanobu Azuma, Keiji Emoto, Makoto Mizuno, Takahiro Nakayama, Toshihiro Maeda, Yoichi Matsuoka
Publikováno v:
SPIE Proceedings.
Nanoimprint Lithography (NIL) has been shown to be an effective technique for replication of nano-scale features. Jet and Flash Imprint Lithography* (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by j
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fb13f9eb0de7e13c0eb1f4e375e92490
https://doi.org/10.1117/12.2279365
https://doi.org/10.1117/12.2279365
Autor:
Hisanobu Azuma, Jin Choi, Yoichi Matsuoka, Masami Yonekawa, Ali Aghili, Makoto Mizuno, Chris E. Jones, Yukio Takabayashi, Takahiro Nakayama
Publikováno v:
SPIE Proceedings.
Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting tec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b9ce4c540fd37b7971c33605d2a3606
https://doi.org/10.1117/12.2257647
https://doi.org/10.1117/12.2257647
Autor:
Masami Yonekawa, Youzou Fukagawa
Publikováno v:
The Proceedings of the Symposium on the Motion and Vibration Control. :10-13
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5033f0fe661cb94307e1b7413b1fe6b0
https://doi.org/10.1299/jsmemovic.2005.9.10
https://doi.org/10.1299/jsmemovic.2005.9.10
Publikováno v:
SPIE Proceedings.
A new SEMI standard E152-0709 "Mechanical Specification of EUV Pod for 150 mm EUVL Reticles" has been published in July 2009. In the standard, reticle grounding requirements are mentioned as related information: an electrical connection between the f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a658435db783384442cd66c40c31396
https://doi.org/10.1117/12.879553
https://doi.org/10.1117/12.879553
Publikováno v:
SPIE Proceedings.
Since 2005, Canon, Nikon, and Entegris have been jointly developing an EUV mask carrier based on the "Dual Pod" concept in place of a pellicle. By using our MIRAI-Selete Mask Protection Engineering (MPE) tool, a few prototypes were tested for perform
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21fc2516281a54fdea00bf6b354e2503
https://doi.org/10.1117/12.867044
https://doi.org/10.1117/12.867044
Publikováno v:
SPIE Proceedings.
To protect the reticle during shipping, storage and tool handling, various reticle pod concepts have been proposed and evaluated in the last 10 years. MIRAI-Selete has been developing EUV reticle handling technology and evaluating EUV reticle pods de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::97549c62f8ba917d84b7586ead3e390c
https://doi.org/10.1117/12.846316
https://doi.org/10.1117/12.846316
Publikováno v:
SPIE Proceedings.
A traditional method of reticle protection, using a pellicle, is thought to be difficult to apply to EUVL tool. There is a possibility that some particles adhere to the surface of a reticle. In order to resolve this reticle issue, we are investigatin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3dfc445b99d8e4a97443cd6d4c302f68
https://doi.org/10.1117/12.711357
https://doi.org/10.1117/12.711357