Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Masami Naitou"'
Autor:
Masahiko Ito, Hiroaki Fujibayashi, Hitoshi Osawa, Hidekazu Tsuchida, Masami Naitou, Fukada Keisuke, Takahiro Kozawa, Hideyuki Uehigashi, Isaho Kamata, Kazukuni Hara
Publikováno v:
Materials Science Forum. 858:173-176
We have developed a single-wafer vertical epitaxial reactor which realizes high-throughput production of 4H-SiC epitaxial layer (epilayer) with a high growth rate [1,2]. In this paper, in order to evaluate the crystalline defects which can affect the
Autor:
Fukada Keisuke, Kazukuni Hara, Hideyuki Uehigashi, Hiroaki Fujibayashi, Masahiko Ito, Sugiura Toshikazu, Masami Naitou, Hidekazu Tsuchida, Takahiro Kozawa, Hitoshi Osawa, Isaho Kamata, Tetsuya Miyazawa
Publikováno v:
Materials Science Forum. 858:119-124
This paper reports on recent advances in 4H-SiC epitaxial growth toward high-throughput production of high-quality and uniform 150 mm-diameter 4H-SiC epilayers by enhancing of growth rates, improving uniformity and reducing defect densities. A vertic
Autor:
Hidekazu Tsuchida, Hirofumi Aoki, Fujibayashi Hiroaki, Hideki Ito, Masami Naitou, Emi Makino, Norihiro Hoshino, Jun Kojima, Masahiko Ito, Tetsuya Miyazawa, Isaho Kamata, Yuichiro Tokuda, Koichi Nishikawa
Publikováno v:
Materials Science Forum. :85-90
This paper introduces our recent challenges in fast 4H-SiC CVD growth and defect reduction. Enhanced growth rates in 4H-SiC epitaxial growth by high-speed wafer rotation and in a high-temperature gas source method promoting SiC bulk growth by increas
Publikováno v:
Masui. The Japanese journal of anesthesiology. 54(4)
There are some reports on the incidence of awareness during general anesthesia that is usually stable at the maintenance period. The aim of this study is to evaluate the incidence of awareness during the induction period of general anesthesia in whic