Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Masaki Toriumi"'
Autor:
Kyoko Sakurada, Youhei Fujimura, Tatsuo Yamaura, Yasuyuki Takeya, Mamoru Namikawa, Kubo Yasumoto, Masaki Toriumi, Kiyoshi Tamura, Mitsuru Tanaka, Masa Ishibashi, Takeshi Tonegwa, Fumiaki Kataoka, Haruo Kobayashi, Taniguchi Masateru, Kiyoyuki Deguchi, Kenji Nawamaki, Naito Yasuyuki, Takahiro Niiyama, Satoru Kawata, Kazuyoshi Otsu, Yoshitaka Sato, Shigeo Itoh, Yoshihisa Marushima, Yuji Obara
Publikováno v:
SID Symposium Digest of Technical Papers. 38:1297-1300
Mono-color Spindt-type Field Emission Displays(FEDs) have been supplied to the market and color FEDs have been started for the preparation of mass production. FEDs have the potential not only to realize superior expression for video picture image, bu
Autor:
Toru Tojo, Akihiko Sekine, Noguchi Shigeru, Masaki Toriumi, T. Takikawa, Ryoichi Hirano, Kiminobu Akeno, Kenji Ooki, T. Shinoda, Munehiro Ogasawara, Shusuke Yoshitake
Publikováno v:
Japanese Journal of Applied Physics. 41:5835-5840
Electron beam mask writing is one of the most promising technologies for reliable fine mask patterning in present and future optical lithography. To establish a high performance mask writing system, not only the development of breakthrough technologi
Autor:
Ayako Kohno, Hideo Nariuchi, Masanosuke Yoshikawa, N Okada, Hirofumi Danbara, Mitsuru Nakayama, Masao Takasaka, Yasuhiro Yoshikawa, Hiroyuki Shimada, C. Sasakawa, Masaki Toriumi
Publikováno v:
Vaccine. 13:1436-1440
A virG thyA double mutant of Shigella flexneri 2a was constructed as a candidate live-attenuated oral vaccine. In the keratoconjunctivitis model it did not provoke any adverse reaction by itself on guinea pigs' eyes and completely protected them from
Publikováno v:
Journal of the Japan Society for Precision Engineering. 61:435-439
The continued demand by the integrated circuit industry for higher device densities has placed requirements on the photolithographic manufacturing system for high accurate photomasks. To obtain the desired photomasks, decrease of pattern distortions
Publikováno v:
Journal of the Japan Society for Precision Engineering. 59:577-582
Autor:
Masaki Toriumi
Publikováno v:
Journal of the Japan Society for Precision Engineering. 57:1726-1730
Autor:
Shusuke Yoshitake, Kenji Ooki, Ryoichi Hirano, Toru Tojo, Yoji Ogawa, Katsuhito Ogura, Teruaki Yamamoto, Masaki Toriumi, Yoshiaki Tada
Publikováno v:
SPIE Proceedings.
Autor:
Yoshiaki Tada, Teruaki Yamamoto, Yoji Ogawa, Shusuke Yoshitake, Toru Tojo, Ryoichi Hirano, Masaki Toriumi, Kenji Ooki, Katsuhito Ogura
Publikováno v:
SPIE Proceedings.
Meeting the latest requirements of aggressive users for the advanced mask for optical lithography will be difficult. In addition, improving the productivity and throughput of the advanced mask with high-density pattern data is necessary. To overcome
Autor:
Naoharu Shimomura, Yoshio Suzuki, Kimio Suzuki, Yoshiaki Hattori, Osamu Watanabe, Souji Koikari, Kiyomi Koyama, Kenji Ooki, Ryoichi Hirano, Noboru Yamada, Hideo Kusakabe, Satoshi Yasuda, Shinsuke Nishimura, Kenji Ohtoshi, Susumu Oogi, Hiroshi Hoshino, Susumu Watanabe, Hitoshi Higurashi, Takayuki Abe, Mitsuko Shimizu, Masaki Toriumi, Shigehiro Hara, Hirohito Anze, Yasuo Suzuki, Shiro Kurasawa, Kazuo Tsuji, Shusuke Yoshitake, Tadahiro Takigawa, Tomohiro Iijima, Takashi Kamikubo, Tetsu Akiyama, Hiroaki Suzuki, Shuichi Tamamushi, Mitsuhiro Yano, Toru Tojo, Ryoji Yoshikawa, Eiji Murakami, Mitsunobu Katayama, Kazuyuki Okuzono, Munehiro Ogasawara, Akira Noma, Koji Handa, Kazuto Matsuki, Hirokazu Yamada, Noriaki Nakayamada, Kiyoshi Hattori, Yuuji Fukudome, Yoshiaki Tada, Seiichi Tsuchiya, Yoji Ogawa, Kiminobu Akeno, Hideyuki Tsurumaki
Publikováno v:
SPIE Proceedings.
Toshiba and Toshiba Machine have developed an advanced electron beam writing system EX-11 for next-generation mask fabrication. EX-11 is a 50 kV variable-shaped beam lithography system for manufacturing 4x masks for 0.15 - 0.18 micrometer technology
Publikováno v:
SAE Technical Paper Series.