Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Masakatsu Hasuda"'
Autor:
Masato Yano, Keiichi Tanaka, Syo Matsumura, Masataka Ohgaki, Hidekazu Suzuki, Masakatsu Hasuda, Masaru Miyayama
Publikováno v:
Key Engineering Materials. 617:94-97
The microcalorimeter detects the energy of incidentX-ray photon by the slight temperature rise of a device at a very low temperature, and the detector of a superconducting transition-edge sensor (TES) microcalorimeter has been developed for the measu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0dfa475fc656611c898a047e1e9d1afd
https://doi.org/10.4028/www.scientific.net/kem.617.94
https://doi.org/10.4028/www.scientific.net/kem.617.94
Autor:
Masato Yano, Syo Matsumura, Keiichi Tanaka, Hidekazu Suzuki, Masataka Ohgaki, Masaru Miyayama, Masakatsu Hasuda
Publikováno v:
Key Engineering Materials. 617:233-236
Transition Edge Sensor (TES) is an energy dispersive X-ray detecting system with high energy resolution. The energy resolution of this system depends on the steepness of superconducting transition curve from normal to superconducting state, heat capa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bebfe28ca60a23bce0f0ba01ec6d6148
https://doi.org/10.4028/www.scientific.net/kem.617.233
https://doi.org/10.4028/www.scientific.net/kem.617.233
Autor:
Takashi Kaito, Masanao Munekane, Toshiharu Kogure, Yukimitsu Kijima, Tatsuya Asahata, Masakatsu Hasuda, Toshitada Takeuchi, Toshiaki Fujii, Koji Iwasaki, Masahiro Kiyohara
Publikováno v:
Journal of Micromechanics and Microengineering. 15:S286-S291
A focused ion beam (FIB) system is process equipment used to make a wide variety of small structures of various materials by irradiating a focused gallium ion beam of nanometer-order diameter to a surface of specimens and by utilizing spattering etch
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9650020bf5206e8fe3fd8187a6ab502a
https://doi.org/10.1088/0960-1317/15/10/s06
https://doi.org/10.1088/0960-1317/15/10/s06
Autor:
Hiroyuki Suzuki, Atsushi Uemoto, Hidekazu Susuki, Xin Man, Toshiaki Fujii, Masakatsu Hasuda, Tatsuya Asahata
Publikováno v:
Microscopy and Microanalysis. 20:354-355
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::08faa7787f5eb88755b855e288043ab4
https://doi.org/10.1017/s1431927614003493
https://doi.org/10.1017/s1431927614003493
Autor:
Koji Iwasaki, Masakatsu Hasuda, Tatsuya Asahata, Masanao Munekane, Yo Yamamoto, Hiromi Tashiro, Toshiaki Fujii, Masahiro Kiyohara, Takashi Kaito, Yutaka Ikku, Toshitada Takeuchi
Publikováno v:
MRS Proceedings. 983
Focused Ion Beam (FIB) system is equipment used to make a wide variety of micro and Nano structures. Structures can be created using various materials by irradiating focused gallium ion beam on to the surface of specimens and by sputtering, etching a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::668e6cb13cb50f3465a3a6c5829282f9
https://doi.org/10.1557/proc-983-0983-ll08-08
https://doi.org/10.1557/proc-983-0983-ll08-08
Autor:
Takashi Kaito, Anto Yasaka, Ryoji Hagiwara, Katsumi Suzuki, Hiroshi Matsumura, Hiroyuki Suzuki, Kouji Iwasaki, Masakatsu Hasuda, Osamu Takaoka, Tatsuya Adachi, Yoh Yamamoto, Noboru Matsumoto, Jiro Yamamoto, Yutaka Ikku, Makoto Sato, Kazuo Aita, Masaki Yamabe, Teruo Iwasaki
Publikováno v:
SPIE Proceedings.
We have studied stencil mask repair technology with focused ion beam and developed an advanced mask repair tool for electron projection lithography. There were some challenges in the stencil mask repair, which were mainly due to its 3-dimensional str
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1d2e938b1c0151ffe8118d015ba99e00
https://doi.org/10.1117/12.557731
https://doi.org/10.1117/12.557731
Autor:
Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, Yasuhiko Sugiyama, Osamu Matsuda, Mamoru Okabe, Shoji Shinohara, Masakatsu Hasuda, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Sato, Naoya Hayashi, Toshiya Ozawa, Yoshihiro Tanaka, Nobuyuki Yoshioka
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a8e8ef68f93754cffc35734e6b06f63d
https://doi.org/10.1117/12.504212
https://doi.org/10.1117/12.504212
Autor:
Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, Yasuhiko Sugiyama, Hiroshi Sawaragi, Mamoru Okabe, Shoji Shinohara, Masakatsu Hasuda, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Sato, Naoya Hayashi, Toshiya Ozawa, Yoshihiro Tanaka, Nobuyuki Yoshioka
Publikováno v:
SPIE Proceedings.
The design rule of the semiconductor devices is getting dramatically tighter as the progress of lithography technology. Photomask is a key factor to support the lithography technology. Defect repairing technology becomes more important than ever for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c68388164d1372cf2f0dd4efe9ea2e4d
https://doi.org/10.1117/12.467357
https://doi.org/10.1117/12.467357