Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Masahiro Nei"'
Autor:
Yasuo Matsuoka, Toshiko Matsumoto, Tadamitsu Asaka, Toshihiko Iijima, Takashi Sakotsubo, Shinji Hirokado, Hideo Ikeda, Tomohiro Akiyama, Hiroyoshi Sato, Hiroshi Yamamoto, Masahiro Nei, Hiroshige Segawa, Nobuyuki Ogura, Shinichiro Chino, Yoshitsugu Tanaka, Nobuyuki Mori, Shoichi Ishii, Yoko Yoshimoto, Takaaki Tanaka, Yasuyuki Nishioka, Shinichi Wakana, Takeshi Tokita, Tuyoshi Kobayashi, Hideaki Yamamoto, Daisuke Nagai, Hiroshi Miyata, Atsushi Watabe
Publikováno v:
The Proceedings of Manufacturing Systems Division Conference. 2019:612
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a7179966a8265e8d78725d896cc6689b
https://doi.org/10.1299/jsmemsd.2019.612
https://doi.org/10.1299/jsmemsd.2019.612
Publikováno v:
SPIE Proceedings.
Nikon released the world's first hyper-NA immersion scanner, the NSR-S609B with NA 1.07 at the beginning of 2006. With the highest NA lens using all-refractive optics, a flexible illumination system, and POLANOTM polarized illumination, the NSR-S609B
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::76e94d83bbd20a730b98f0694bb1fefb
https://doi.org/10.1117/12.712042
https://doi.org/10.1117/12.712042
Publikováno v:
SPIE Proceedings.
VLSI chips are becoming denser and the industry is now moving to the development of devices at the 65nm node. While Nikon is working toward the development of next-generation lithography tools, we are also making efforts to extend the life of DUV exc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::43fd9f7c3c320f8267a25c311dc34772
https://doi.org/10.1117/12.656349
https://doi.org/10.1117/12.656349
Publikováno v:
Optical Microlithography XVIII.
To meet shrinkage demands of device pattern size, a new platform ArF exposure tool , NSR-S308F, has been developed with an extremely high NA projection lens. This equipment has been developed not only for ensuring better imaging of dry ArF, but also
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::af41619e76d2dc5754a4e20d9654b54c
https://doi.org/10.1117/12.599564
https://doi.org/10.1117/12.599564
Publikováno v:
SPIE Proceedings.
Nikon has developed cutting-edge lithography tools, and its product lineup encompasses all exposure wavelengths. They are: the NSR-S307E ArF scanner for the 90nm node; the NSR-S207D KrF scanner for the 110nm node; the NSR-SF130 i-line stepper for the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0b56ad4ec597ef8dfcdbb45372d90c0a
https://doi.org/10.1117/12.537214
https://doi.org/10.1117/12.537214
Publikováno v:
SPIE Proceedings.
Industry trends indicate that the next generation of exposure tool will be scanning steppers. Scanning steppers have a 25 mm by 33 mm field using 6 inch reticles. For device manufacturing, first generation 256M DRAM chips are roughly 12.5 mm by 25 mm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f8fc1b49ccf80cd136eca55f65ecbcf
https://doi.org/10.1117/12.277252
https://doi.org/10.1117/12.277252
Autor:
Koichi Matsumoto, Masaomi Kameyama, Shinichi Nakamura, Seiro Murakami, Kazuo Ushida, Masahiro Nei, Hidemi Kawai
Publikováno v:
SPIE Proceedings.
A new optical stepper, NSR-1505G6E, has been developed and it will be one of the most promising exposure apparatuses for half-micron lithography in the next era. g-line is used as an exposure wavelength, and the 5X-type projection lens has 15 mm by 1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::af044dee298f660cbcd076be7b16e89c
https://doi.org/10.1117/12.953144
https://doi.org/10.1117/12.953144
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