Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Marwah Shafee"'
Autor:
Nabil Sabry, Sherif Hammouda, Sarah Risk, Joe Kwan, Mostafa Alaa, Wael El-Manhawy, Kareem Madkour, SeungJo Lee, Jongha Park, Marwah Shafee, Aliaa Kabeel, Mohamed Bahnasawi, Abdelrahman Abdelrazek, Jin Hee Kim
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIV.
At the core of Design-technology co-optimization (DTCO) processes, is the Design Space Exploration (DSE), where different design schemes and patterns are systematically analyzed and design rules and processes are co-optimized for optimal yield and pe
Autor:
Mona M. Hella, Wojciech Knap, Stéphane Blin, Marwah Shafee, Philippe Le Bars, Guillaume Ducournau, Walaa Sahyoun, Kefei Wu
Publikováno v:
2020 IEEE Radio and Wireless Symposium (RWS)
2020 IEEE Radio and Wireless Symposium (RWS), Jan 2020, San Antonio, United States. pp.72-75, ⟨10.1109/RWS45077.2020.9050055⟩
RWS
2020 IEEE Radio and Wireless Symposium (RWS), Jan 2020, San Antonio, United States. pp.72-75, ⟨10.1109/RWS45077.2020.9050055⟩
RWS
International audience; This paper presents a fully integrated receiver for 300 GHz communication using plasma-wave field effect transistor (FET) detector in digital 65 nm CMOS technology (fT/fmax=170/230 GHz). Besides the detector, the receiver chai
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::42ad2f55ac8e2d554edb5df188c1c176
https://hal.archives-ouvertes.fr/hal-02529654
https://hal.archives-ouvertes.fr/hal-02529654
Autor:
Jae-Hyun Kang, Aliaa Kabeel, Namjae Kim, Sangah Lee, Wael ElManhawy, Marwah Shafee, Sangwoo Jung, Asmaa Rabie, Kareem Madkour, Ahmed ElGhoroury, Seung Weon Paek, Joe Kwan, Ki-Heung Park, Jiwon Oh
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIII.
As the typical litho hotspot detection runtime continue to increase with sub-10nm technology node due to increasing design and process complexity, many DFM techniques are exploring new methods that can expedite some of their advanced verification pro
Autor:
Marwah Shafee, Mohamed Dessouky, Hazem Hegazy, Shrouk Shafie, Sherif Hammouda, Mona El-Sabagh
Publikováno v:
ICM
This work introduces a modified model for microstrip transmission lines (TL) over silicon substrates. It targets millimeter-wave circuits in modern chip fabrication technologies with thin dielectric height and slotted ground planes, where existing mo
Publikováno v:
Progress In Electromagnetics Research M. 30:195-209
The theory of even/odd mode based dual composite right/left handed (D-CRLH) unit cells is developed, and a unifled modeling approach based on stubs is presented. The theory shows that these unit cells will have left-handed behavior if the even and od
Autor:
Dominique Coquillat, Philippe Nouvel, Stéphane Blin, Wojciech Knap, Marwah Shafee, Annick Penarier, Amr M.E. Safwa, Mona M. Hella, Shamsun Nahar
Publikováno v:
European Physical Journal: Applied Physics
European Physical Journal: Applied Physics, EDP Sciences, 2016, 76 (2), pp.20101. ⟨10.1051/epjap/2016160302⟩
European Physical Journal: Applied Physics, EDP Sciences, 2016, 76 (2), pp.20101. ⟨10.1051/epjap/2016160302⟩
Design, manufacturing and measurements results for silicon plasma wave transistors based wireless communication wideband receivers operating at 300 GHz carrier frequency are presented. We show the possibility of Si-CMOS based integrated circuits, in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::046e5195390986a6a078e380ec3ccbe3
https://hal.archives-ouvertes.fr/hal-01510368
https://hal.archives-ouvertes.fr/hal-01510368
Publikováno v:
Progress In Electromagnetics Research C. 17:67-78
This paper presents the theory, properties, types, and applications of high impedance wires (HIWs). The effective permeability of a transmission line that consists of an HIW and a second conductor has a resonating behavior. Consequently, slow-wave an
Autor:
Jae-Hyun Kang, Steve Kwon, Marwah Shafee, Jinho Park, Jean-Marie Brunet, Joe Kwan, Wael ElManhawy, Namjae Kim, Seung Weon Paek, Kareem Madkour
Publikováno v:
SPIE Proceedings.
Achieving lithographic printability at advanced nodes (14nm and beyond) can impose significant restrictions on physical design, including large numbers of complex design rule checks (DRC) and compute-intensive detailed process model checking. Early i
Publikováno v:
2014 IEEE International Conference on Ultra-WideBand (ICUWB).
Publikováno v:
SPIE Proceedings.
Integrated circuits suffer from serious layout printability issues associated to the lithography manufacturing process. Regular layout designs are emerging as alternative solutions to help reducing these systematic sub-wavelength lithography variatio