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pro vyhledávání: '"Martin Steglich"'
Autor:
Martin Steglich, Christian Patzig, Lutz Berthold, Frank Schrempel, Kevin Füchsel, Thomas Höche, Ernst-Bernhard Kley, Andreas Tünnermann
Publikováno v:
AIP Advances, Vol 3, Iss 7, Pp 072108-072108 (2013)
The growth of Ge on Si(100) by DC Magnetron Sputtering at various temperatures is studied by Spectroscopic Ellipsometry and Transmission Electron Microscopy. Smooth heteroepitaxial Ge films are prepared at relatively low temperatures of 380°C. Typic
Externí odkaz:
https://doaj.org/article/215bfc868e7b411ab5272532c15e96eb
Publikováno v:
Advances in X-Ray/EUV Optics and Components XV.
In addition to applications based on particle accelerator sources the XUV wavelength range is interesting for several further fields of research – for example in astronomy. On one hand, due to the short wavelengths a diffraction grating for these a
Autor:
Yueqian Zhang, Martin Landmann, Stefan Heist, Gunther Notni, Peter Kühmstedt, Martin Steglich
Publikováno v:
Dimensional Optical Metrology and Inspection for Practical Applications VIII.
3D sensors based on pattern projection are a popular measuring instrument for the three-dimensional acquisition of people, e.g., for identification purposes or for human-machine interaction. State-of-the-art sensors typically project the pattern(s) a
Publikováno v:
Integrated Optics: Design, Devices, Systems, and Applications V.
Backside illumination enables an increase in photoactive area and numerical aperture of Ge-on-Si photodetectors for SWIR applications. The transparency of silicon in the infrared range (λ > 1.1 μm) allows a nearly lossless propagation of incoming l
Autor:
Martin Steglich, Astrid Bingel, Robert A. Müller, Norbert Kaiser, Andreas Tünnermann, Philipp Naujok, Ulrike Schulz
Publikováno v:
Thin Solid Films. 616:594-600
Highly transparent and conductive Al-doped ZnO/Ag/Al-doped ZnO (AZO/Ag/AZO) multilayers were prepared by industrial inline DC magnetron sputtering on glass substrates at room temperature. With optimized film thicknesses of 37 nm/10 nm/37 nm, an optim
Publikováno v:
Infrared Physics & Technology. 69:218-221
Statistical Black Silicon antireflection structures for the mid-infrared spectral region, fabricated by Inductively Coupled Plasma Reactive Ion Etching, are investigated. Upon variation of etch duration scaling of the structure morphologies is observ
Autor:
Martin Steglich, Oliver Puffky
Publikováno v:
Silicon Nanomaterials Sourcebook ISBN: 9781315153551
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6fec22d3330c6cc4751a21151571431e
https://doi.org/10.4324/9781315153551-18
https://doi.org/10.4324/9781315153551-18
Publikováno v:
physica status solidi (b). 252:105-111
THz emission from semiconductor surfaces is influenced by the sign and strength of the surface field as well as the relaxation dynamics of the photoinduced carriers. In this paper, an experimental study on argon implanted silicon surfaces is presente
Autor:
Kay Dietrich, Thomas Pertsch, Andreas Tünnermann, Ernst-Bernhard Kley, Carsten Rockstuhl, Martin Steglich, Uwe Hübner, Thomas Siefke, Matthias Zilk
Publikováno v:
Advanced Functional Materials. 30:1905722
Publikováno v:
SPIE Proceedings.
Thanks to its high quality and low cost, silicon is the material of choice for optical devices operating in the mid-infrared (MIR; 2 μm to 6 μm wavelength). Unfortunately in this spectral region, the refractive index is comparably high (about 3.5)