Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Martin Sobczak"'
Autor:
Garian Lim, Pritha Choudhury, Siuli Sarkar, Prathap Augustine, Anil Kumar, Raghu R. Rangaraju, Rommel T. Bumagat, Divya Kosuri, Martin Sobczak, Suresh Telu, Morgana de Avila Ribas, Bawa Singh
Publikováno v:
2015 IEEE 17th Electronics Packaging and Technology Conference (EPTC).
Wafer-Level Chip-Scale Packaging (WLCSP) has become increasingly popular in portable electronics. One of its main characteristics is its reduced scale and that the solder balls are attached directly to the device. One of the main challenges in WLCSP
Autor:
Peter J. Wagner, Martin Sobczak
Publikováno v:
Tetrahedron Letters. 39:2523-2526
UV irradiation of the title compound produces cis-1,2-diphenylbenzocyclobutenol quantitatively. While stable at temperatures below 0°, at room temperature it establishes a high enough equilibrium population of its EE o-xylylenol precursor to undergo
Publikováno v:
Journal of the American Chemical Society. 117:7619-7629
Autor:
Ritwik Chatterjee, Scott K. Pozder, Hannes Kostner, Ankur Jain, Eddie Acosta, Martin Sobczak, Senthil Kanagavel, Gerhard Hillmann, Bill Marlin, Gerald Kreindl, Stefan Pargfrieder, Robert E. Jones, Zhihong Huang
Publikováno v:
2008 International Interconnect Technology Conference.
The simultaneous formation of Cu/Sn microconnects and an adhesive bond during wafer level thermal compression bonding was evaluated using a 3D enabled single metal level test die and wafer. The wafer level bond process relied on locally dispensed adh
Autor:
Peter J. Wagner, Martin Sobczak and
Publikováno v:
Organic letters. 4(3)
Near-UV irradiation of both o-acetylphenyl- and o-benzoylphenylacetic acids in benzene solution results in their efficient decarboxylation. Their meta and para isomers do not undergo this process. The O-deuterated acids yield deuterated o-acyltoluene
Publikováno v:
Journal of the American Chemical Society. 120:2488-2489