Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Martin Schriever"'
Autor:
Wim de Boeij, Mark van de Kerkhof, Haico Victor Kok, Gregg M. Gallatin, Kafai Lai, Daniel Corliss, Jaime D. Morillo, Martin Schriever, Robert H. Fair, Stephanie Bennett
Publikováno v:
SPIE Proceedings.
A new paradigm of lens metrology, which is an on-board in-situ interferometer on a scanner, is evaluated. We called this system as Inline PMI and is based on a shearing type interferometer. Wavefront gradient data is measured and used to reconstruct
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e3f6bf940847e2c3c3e1afc8240bf536
https://doi.org/10.1117/12.536550
https://doi.org/10.1117/12.536550
Autor:
Helmut Haidner, Oscar Noordman, Melchior Mulder, Manfred Maul, Marco Hugo Petrus Moers, Jan van Schoot, Robert John Socha, Jan Baselmans, Donis G. Flagello, Xuelong Shi, Jo Finders, Andre Engelen, Wim de Boeij, Martin Schriever, Rene Carpaij, Ulrich Wegmann, Markus Goeppert, Mark van de Kerkhof, Paul Graeupner, Henk van Greevenbroek
Publikováno v:
SPIE Proceedings.
Current roadmaps show that the semiconductor industry continues to drive the usable Rayleigh resolution towards thefundamental limit (for 50% duty cycle lines) at k 1 =0.25. This is being accomplished through use of various resolutionenhancement tech
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07698b9bd527cac614680a8761581b9b
https://doi.org/10.1117/12.485340
https://doi.org/10.1117/12.485340