Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Martin J Hÿtch"'
Autor:
Kilian Gruel, Raphaël Serra, Leifeng Zhang, Aurélien Masseboeuf, Martin J Hÿtch, Christophe Gatel
Publikováno v:
Microscopy and Microanalysis. 28:2278-2280
Autor:
Rafal E, Dunin-Borkowski, Takeshi, Kasama, Alexander, Wei, Steven L, Tripp, Martin J, Hÿtch, Etienne, Snoeck, Richard J, Harrison, Andrew, Putnis
Publikováno v:
Microscopy research and technique. 64(5-6)
A selection of recent results illustrating the application of off-axis electron holography to the study of magnetic microstructure in closely-spaced nanoparticles and nanowires is reviewed. Examples are taken from the characterization of FeNi nanopar
Autor:
Daniele Barettin, Matthias Auf Der Maur, Aldo Di Carlo, Alessandro Pecchia, Andrei F Tsatsulnikov, Wsevolod V Lundin, Alexei V Sakharov, Andrei E Nikolaev, Maxim Korytov, Nikolay Cherkashin, Martin J Hÿtch, Sergey Yu Karpov
Publikováno v:
Nanotechnology; 7/7/2017, Vol. 28 Issue 27, p1-1, 1p
Autor:
Daniele Barettin, Matthias Auf der Maur, Aldo di Carlo, Alessandro Pecchia, Andrei F Tsatsulnikov, Alexei V Sakharov, Wsevolod V Lundin, Andrei E Nikolaev, Sergey O Usov, Nikolay Cherkashin, Martin J Hÿtch, Sergey Yu Karpov
Publikováno v:
Nanotechnology; 1/6/2017, Vol. 28 Issue 1, p1-1, 1p
Autor:
Boureau, Victor
Publikováno v:
Physique [physics]. Université de Toulouse III-Paul Sabatier, 2016. Français. ⟨NNT : ⟩
Physique [physics]. Université de Toulouse III-Paul Sabatier, 2016. Français
Physique [physics]. Université de Toulouse III-Paul Sabatier, 2016. Français
After being considered harmful for a long time, stress became one of the principal means to improve metal-oxide-semiconductor (MOS) device performance. Indeed, the generated strains significantly increase carrier mobility in silicon. Within this cont
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::511b20527a86cf761c8ea2056e5771b2
https://theses.hal.science/tel-01786799
https://theses.hal.science/tel-01786799
Autor:
Victor Boureau
Publikováno v:
Victor Boureau
Physique [physics]. Université de Toulouse III-Paul Sabatier, 2016. Français. ⟨NNT : ⟩
Physique [physics]. Université de Toulouse III-Paul Sabatier, 2016. Français
Physique [physics]. Université de Toulouse III-Paul Sabatier, 2016. Français. ⟨NNT : ⟩
Physique [physics]. Université de Toulouse III-Paul Sabatier, 2016. Français
After being considered harmful for a long time, stress became one of the principal means to improve metal-oxide-semiconductor (MOS) device performance. Indeed, the generated strains significantly increase carrier mobility in silicon. Within this cont
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::464aafb1403809041d3c5d485f30fe32
http://thesesups.ups-tlse.fr/3252/
http://thesesups.ups-tlse.fr/3252/