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pro vyhledávání: '"Martin, Čalkovský"'
Autor:
Martin Čalkovský, Erich A. Müller, Dagmar Gerthsen, Alexander Colsmann, Yonghe Li, Christian Sprau
Publikováno v:
ACS Applied Materials & Interfaces. 13:53252-53261
The distinction of different organic materials in phase mixtures is hampered in electron microscopy because electron scattering does not strongly differ in carbon-based materials that mainly consist of light elements. A successful strategy for contra
Autor:
Dagmar Gerthsen, Martin Čalkovský, Erich A. Müller, Yonghe Li, Christian Sprau, Alexander Colsmann
Publikováno v:
Microscopy and Microanalysis. 27:1922-1925
Autor:
Nadejda Firman, Martin Čalkovský, Matthias Meffert, Erich Müller, Martin Wegener, Frederik Mayer, Dagmar Gerthsen
Publikováno v:
Microscopy and Microanalysis. 27:778-781
Focused-ion-beam/scanning-electron-microscopy (FIB-SEM) tomography has become increasingly important to investigate the three-dimensional (3D) distribution of different phases in inhomogeneous materials. However, quantitative analysis of 3D structure
Publikováno v:
Journal of Microscopy, 289 (1), 32-47
Backscattered-electron scanning electron microscopy (BSE-SEM) imaging is a valuable technique for materials characterisation because it provides information about the homogeneity of the material in the analysed specimen and is therefore an important
Autor:
Igor, Sokolović, Michele, Reticcioli, Martin, Čalkovský, Margareta, Wagner, Michael, Schmid, Cesare, Franchini, Ulrike, Diebold, Martin, Setvín
Publikováno v:
Proc Natl Acad Sci U S A
Interaction of molecular oxygen with semiconducting oxide surfaces plays a key role in many technologies. The topic is difficult to approach both by experiment and in theory, mainly due to multiple stable charge states, adsorption configurations, and
Autor:
Pavel A. Levkin, Andreas Niemeyer, Rasmus R. Schröder, Zhe-Qin Dong, Martin Čalkovský, Daniel Ryklin, Irene Wacker, Frederik Mayer, Dagmar Gerthsen, Martin Wegener, Ronald Curticean
Publikováno v:
Advanced materials, 32 (32), Art. Nr.: 2002044
A photoresist system for 3D two���photon microprinting is presented, which enables the printing of inherently nanoporous structures with mean pore sizes around 50 nm by means of self���organization on the nanoscale. A phase separation bet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a552c9b9b4c37450b4e5cf0b06968fd6
https://publikationen.bibliothek.kit.edu/1000122747/86219559
https://publikationen.bibliothek.kit.edu/1000122747/86219559
Publikováno v:
Ultramicroscopy. 207
For quantitative electron microscopy the comparison of measured and simulated data is essential. Monte Carlo (MC) simulations are well established to calculate the high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) i
Publikováno v:
Microscopy and Microanalysis. 25:464-465