Low Pressure Chemical Vapor Deposition as a Tool for Deposition of Thin Film Battery Materials

Autor: Teus Van Dongen, Peter H. L. Notten, Rogier Adrianus Henrica Niessen, Mart De Croon, J.F.M. Oudenhoven

Publikováno v: 17th International Chemical Vapor Deposition Symposium (CVD-XVII) as part of the 216th Meeting of the Electrochemical Society 4-9 October 2009, Vienna, 653-658
STARTPAGE=653;ENDPAGE=658;TITLE=17th International Chemical Vapor Deposition Symposium (CVD-XVII) as part of the 216th Meeting of the Electrochemical Society 4-9 October 2009, Vienna

Low Pressure Chemical Vapor Deposition was utilized for the deposition of LiCoO2 cathode materials for all-solid-state thin-film micro-batteries. To obtain insight in the deposition process, the most important process parameters were optimized for th

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::09e9c1443374b43576734dde1b83b40d
https://doi.org/10.1149/1.3207652

Low Pressure Chemical Vapour Deposition as a Tool for Deposition of Thin Film Battery Materials

Autor: Jos Oudenhoven, Teus Van Dongen, Rogier Niessen, Mart De Croon, Peter Notten

Publikováno v: ECS Meeting Abstracts. :2567-2567

not Available.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c2dd4cdf1522f4bb7448c46db5bc428e
https://doi.org/10.1149/ma2009-02/34/2567