Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Marleen Kooiman"'
Autor:
Paul van Adrichem, DS Nam, Jan Mulkens, Emily Gallagher, Andreas Frommhold, Marleen Kooiman, Vidya Vaenkatesan, Michael Kubis, Lieve Van Look
Publikováno v:
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology.
The mask is a known contributor to intra-field fingerprints at the wafer level. Traditionally, a 3σ distribution of critical dimensions (CDs) on mask was considered sufficient to characterize the contribution to the CD distribution at wafer level. R
Autor:
Ruochong Fei, Dorothe Oorschot, Jin-Woo Lee, Marleen Kooiman, Hwan Kim, shu-yu lai, Jaehee Hwang, Kang-San Lee, Chang-Moon Lim, Marc Kea, Inhwan Lee, Willem van Mierlo, Ziyang Wang, Harm Dillen, Jung-Hyun Kang
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
Introduction and problem statement Given that EUV lithography allows printing smaller Critical Dimension (CD) features, it can result in non-normal distributed CD populations on ADI wafers [Civay SPIE AL 2014], leading to errors in predicted failure
Publikováno v:
Journal of the Mechanics and Physics of Solids, 90, 77-90. Elsevier
The plastic response of metals is determined by the collective, coarse-grained dynamics of dislocations, rather than by the dynamics of individual dislocations. The evolution equations at both levels are quite different, for example considering their
Publikováno v:
Journal of the Mechanics and Physics of Solids, 88. Elsevier
The collective dynamics of dislocations is the underlying mechanism of plastic deformation in metallic crystals. Dislocation motion in metals generally occurs on multiple slip systems. The simultaneous activation of different slip systems plays a cru
Autor:
Marc Kea, Peng Tang, Pengcheng Zhang, Harm Dillen, Daniel Tien, Stefan Hunsche, Marleen Kooiman, Yi-Hsin Chang, Gijsbert Rispens, Fei Wang, Fuming Wang
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2018.
Traditionally, the performance of a lithography or patterning step is described by its mean size and the spread at a 3 sigma probability. Recent papers by Bristol, Brunner and others have shown this is insufficient to describe the process capability
Publikováno v:
Journal of the Mechanics and Physics of Solids, 78, 186-209. Elsevier
The dynamics of large amounts of dislocations is the governing mechanism in metal plasticity. The free energy of a continuous dislocation density profile plays a crucial role in the description of the dynamics of dislocations, as free energy derivati
Publikováno v:
Journal of Statistical Mechanics : Theory and Experiment, 4:P04028, 1-45. Institute of Physics
We derive the grand-canonical partition function of straight and parallel dislocation lines without making a priori assumptions on the temperature regime. Such a systematic derivation for dislocations has, to the best of our knowledge, not been carri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4c3119f63e71b0b94f25f32a6a10d54f
https://research.tue.nl/nl/publications/ae4e4ea5-33b6-4652-9e2f-499c606cabf5
https://research.tue.nl/nl/publications/ae4e4ea5-33b6-4652-9e2f-499c606cabf5
Publikováno v:
Journal of Statistical Mechanics : Theory and Experiment, 2015:P06005. Institute of Physics
The dynamics of large amounts of dislocations governs the plastic response of crystalline materials. In this contribution we discuss the relation between the mobility of discrete dislocations and the resulting flow rule for coarse-grained dislocation