Zobrazeno 1 - 10
of 26
pro vyhledávání: '"Markus Bina"'
Autor:
Hans Reisinger, Yury Yu. Illarionov, Markus Bina, Stanislav Tyaginov, K. Rott, Ben Kaczer, Tibor Grasser
Publikováno v:
IEEE Transactions on Electron Devices. 62:2730-2737
A novel method for the extraction of the lateral position of border traps in nanoscale MOSFETs is presented. Using technology computer-aided design (TCAD) simulations, we demonstrate that the dependence of the trap-induced threshold voltage shift on
Autor:
Rainer Minixhofer, Karl Rupp, Hajdin Ceric, Yannick Wimmer, Hubert Enichlmair, Markus Bina, Stanislav Tyaginov, Prateek Sharma, Florian Rudolf, Jong Mun Park, Tibor Grasser
Publikováno v:
IEEE Transactions on Electron Devices. 62:1811-1818
We propose two different approaches to describe carrier transport in n-laterally diffused MOS (nLDMOS) transistor and use the calculated carrier energy distribution as an input for our physical hot-carrier degradation (HCD) model. The first version r
Autor:
Karl Rupp, Markus Bina, Tibor Grasser, Ben Kaczer, Jacopo Franco, Yannick Wimmer, Dmitry Osintsev, Stanislav Tyaginov
Publikováno v:
IEEE Transactions on Electron Devices. 61:3103-3110
We present a physics-based hot-carrier degradation (HCD) model and validate it against measurement data on SiON n-channel MOSFETs of various channel lengths, from ultrascaled to long-channel transistors. The HCD model is capable of representing HCD i
Autor:
J. Franco, Tibor Grasser, Yu. Yu. Illarionov, Markus Bina, Stanislav Tyaginov, Mikhail I. Vexler, B. Kaczer, Johann Cervenka
Publikováno v:
Journal of Computational Electronics. 13:733-738
We model the main characteristics of metal-insulator-silicon field-effect transistors (MISFETs) with different gate insulators using the carrier energy distribution function calculated with a Spherical Harmonics Expansion method. In addition to stand
Autor:
M. Toledano-Luque, Franz Schanovsky, Ben Kaczer, Oskar Baumgartner, Markus Bina, Wolfgang Goes, Tibor Grasser
Publikováno v:
ECS Transactions. 58:31-47
Recently, correlated drain and gate current fluctuations have been observed in nano-scaled MOSFETs, indicating that their occurrence is linked to the same defect. One explanation for this observation can be given by the multi-state defect model, whic
Publikováno v:
2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).
In this work, we concentrate on extending our optimization method for IGBTs [1] in drives applications by incorporating diode parameters in addition to IGBT parameters. For this purpose, the fabrication process of the diode, including a platinum diff
Autor:
Hubert Enichlmair, Prateek Sharma, Hajdin Ceric, Jong Mun Park, Yannick Wimmer, Stanislav Tyaginov, Florian Rudolf, Tibor Grasser, Karl Rupp, Markus Bina
Publikováno v:
2015 IEEE 27th International Symposium on Power Semiconductor Devices & IC's (ISPSD).
We present a physical model for hot-carrier degradation (HCD) which is based on the information provided by the carrier energy distribution function. In the first version of our model the distribution function is obtained as the exact solution of the
Autor:
Aaron Thean, Ph. J. Roussel, Erik Bury, Tibor Grasser, V. Putcha, Stanislav Tyaginov, Naoto Horiguchi, Gregory Pitner, Thomas Chiarella, Luis-Miguel Procel, Ben Kaczer, Zhigang Ji, Felice Crupi, Jacopo Franco, A. De Keersgieter, Pieter Weckx, Guido Groeseneken, Yannick Wimmer, Markus Bina, Lionel Trojman, Moonju Cho
Publikováno v:
2015 IEEE International Reliability Physics Symposium (IRPS)
2015 IEEE International Reliability Physics Symposium (IRPS), Apr 2015, Monterey, United States. pp.3B.5.1-3B.5.6, ⟨10.1109/IRPS.2015.7112706⟩
IRPS
2015 IEEE International Reliability Physics Symposium (IRPS), Apr 2015, Monterey, United States. pp.3B.5.1-3B.5.6, ⟨10.1109/IRPS.2015.7112706⟩
IRPS
Channel hot carrier (CHC) stress is observed to result in higher variability of degradation in deeply-scaled nFinFETs than bias temperature instability (BTI) stress. Potential sources of this increased variation are discussed and the intrinsic time-d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::203b6d7bb8d6108b6824462c91bf4443
https://hal.archives-ouvertes.fr/hal-02952187
https://hal.archives-ouvertes.fr/hal-02952187
Autor:
Tibor Grasser, Stanislav Tyaginov, Karl Rupp, Jong Mun Park, Rainer Minixhofer, Hajdin Ceric, Florian Rudolf, Yannick Wimmer, Hubert Enichlmair, Markus Bina
Publikováno v:
2014 IEEE International Integrated Reliability Workshop Final Report (IIRW).
Our physics-based HCD model has been validated using scaled CMOS transistors in our previous work. In this work we apply this model for the first time to a high-voltage nLDMOS device. For the calculation of the degrading behaviour the Boltzmann trans
Autor:
Markus Bina, B. Kaczer, Hubert Enichlmair, J. Franco, Hajdin Ceric, Stanislav Tyaginov, Yannick Wimmer, Florian Rudolf, Jong Mun Park, Tibor Grasser
Publikováno v:
2014 IEEE International Integrated Reliability Workshop Final Report (IIRW).
Using our physics-based model for hot-carrier degradation (HCD) we analyze the role of such important processes as the Si-H bond-breakage induced by a solitary hot carrier, bond dissociation triggered by the miltivibrational excitation of the bond, a