Zobrazeno 1 - 10
of 80
pro vyhledávání: '"Markku Leskela"'
Autor:
Elisa Atosuo, Mikko J. Heikkilä, Johanna Majlund, Leevi Pesonen, Miia Mäntymäki, Kenichiro Mizohata, Markku Leskelä, Mikko Ritala
Publikováno v:
ACS Omega, Vol 9, Iss 10, Pp 11747-11754 (2024)
Externí odkaz:
https://doaj.org/article/5e29f04b0da349b4bd53e870bf29f7f7
Autor:
Xinzhi Li, Marko Vehkamäki, Mykhailo Chundak, Kenichiro Mizohata, Anton Vihervaara, Markku Leskelä, Matti Putkonen, Mikko Ritala
Publikováno v:
Advanced Materials Interfaces, Vol 10, Iss 18, Pp n/a-n/a (2023)
Abstract This paper presents preparation of boron‐doped Al2O3 thin films by atomic layer deposition (ALD) using phenylboronic acid (PBA) and trimethylaluminum (TMA) as precursors. Deposition temperatures of 160–300 °C are studied, giving a maxim
Externí odkaz:
https://doaj.org/article/fa8a24ac350e4037885909bda389a47c
Autor:
Saba Ghafourisaleh, Marko Vehkamäki, Anton Vihervaara, Chao Zhang, Mikko J. Heikkilä, Markku Leskelä, Matti Putkonen, Mikko Ritala
Publikováno v:
Advanced Materials Interfaces, Vol 10, Iss 7, Pp n/a-n/a (2023)
Abstract In this paper, the deposition of pyrrone thin film materials by molecular layer deposition (MLD) is reported for the first time using pyromellitic dianhydride (PMDA) and 3,3'‐diaminobenzidine (DAB) as monomers, and ozone as a promoting pre
Externí odkaz:
https://doaj.org/article/e8a5f8232fd84c6f8c73612f3e4d624d
Autor:
Alexander Weiß, Jacqueline Goldmann, Sakari Kettunen, Georgi Popov, Tomi Iivonen, Miika Mattinen, Pasi Jalkanen, Timo Hatanpää, Markku Leskelä, Mikko Ritala, Marianna Kemell
Publikováno v:
Advanced Materials Interfaces, Vol 10, Iss 3, Pp n/a-n/a (2023)
Abstract Copper iodide (CuI) is a high‐performance p‐type transparent semiconductor that can be used in numerous applications, such as transistors, diodes, and solar cells. However, the lack of conformal and scalable methods to deposit CuI thin f
Externí odkaz:
https://doaj.org/article/e8ba49444f6f4cb6ad4411c38c05b12d
Publikováno v:
ACS Omega, Vol 6, Iss 27, Pp 17545-17554 (2021)
Externí odkaz:
https://doaj.org/article/73eef9b953534c7cadbf3d5420afa2cc
Autor:
Rochelly da Silva Mesquita, Andrii Kyrylchuk, Iryna Grafova, Denys Kliukovskyi, Andriy Bezdudnyy, Alexander Rozhenko, Wanderli Pedro Tadei, Markku Leskelä, Andriy Grafov
Publikováno v:
PLoS ONE, Vol 15, Iss 2, p e0227811 (2020)
Anopheles darlingi is the main vector of malaria in Brazil, characterized by a high level of anthropophilia and endophagy. Imidacloprid, thiacloprid, and acetamiprid are the most widespread insecticides of the neonicotinoid group. However, they produ
Externí odkaz:
https://doaj.org/article/c4f5e79a3198481d9fc50c0f80370791
Publikováno v:
Atomic Layer Deposition for Semiconductors
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2577e065e9ef932e419bbc8113562a34
https://doi.org/10.1007/978-1-4614-8054-9
https://doi.org/10.1007/978-1-4614-8054-9
Autor:
Tomi Iivonen, Mikko J. Heikkilä, Georgi Popov, Heta-Elisa Nieminen, Mikko Kaipio, Marianna Kemell, Miika Mattinen, Kristoffer Meinander, Kenichiro Mizohata, Jyrki Räisänen, Mikko Ritala, Markku Leskelä
Publikováno v:
ACS Omega, Vol 4, Iss 6, Pp 11205-11214 (2019)
Externí odkaz:
https://doaj.org/article/8ba23ee469a7480dac0d814a55642db1
Autor:
Tianniu Chen, Thomas M. Cameron, Shawn D. Nguyen, Gregory T. Stauf, David W. Peters, Leah Maylott, Weimin Li, Chongying Xu, Jeffrey F. Roeder, Monica Hilgarth, Jaakko Niinisto, Kaupo Kukli, Mikko Ritala, Markku Leskela
Publikováno v:
ECS Meeting Abstracts. :1886-1886
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6861f40f4a2cf4ffda7a08891e29497a
https://doi.org/10.1149/ma2008-02/24/1886
https://doi.org/10.1149/ma2008-02/24/1886