Impact of Atomic Layer Deposition Chemistry to the Quality of High-Permittivity Metal Oxide Thin Solid Films

Autor: Kaupo Kukli, Mikko Ritala, Markku Antero Leskelä

Publikováno v: University of Helsinki

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::92d7c623643ce89966db9576b4999231
https://researchportal.helsinki.fi/en/publications/9dea623f-ffe6-481c-b4df-b082522b08cf

Catalytic Pre-treatment of Lignocellulosic Raw Materials

Autor: Petro Lahtinen, Weymarn, N., Lankinen, E., Timo Repo, Markku Antero Leskelä, Kallioinen, A., Uusitalo, J., Siika-Aho, M., Tamminen, T.

Publikováno v: University of Helsinki
Lahtinen, P, von Weymarn, N, Lankinen, E, Repo, T, Leskelä, M, Kallioinen, A, Uusitalo, J, Siika-aho, M & Tamminen, T 2008, Catalytic pre-treatment of lignocellulosic raw materials . in Proceedings : 10th European Workshop on Lignocellulosics and Pulp . 10th European Workshop on Lignocellulosics and Pulp, Stockholm, Sweden, 25/08/08 .

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::cec2e1de450a594d1cecf4da2e274f70
https://researchportal.helsinki.fi/en/publications/c825e81d-875b-4b2f-a189-2e36673aabbc

Thermal decomposition of Ti(Se, Te) in argon and nitrogen atmospheres

Autor: Yu Pankratova, O., Zvinchuk, R. A., Suvorov, A. V., Timo Hatanpää, Kozlov, V. I., Markku Antero Leskelä

Publikováno v: University of Helsinki

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::59bf74be3845a811afc9aad9c7825900
https://researchportal.helsinki.fi/en/publications/282519d6-9327-427a-9ea4-00b40d16abd9

Electrical Defects in Atomic Layer Deposited HfO2 Films on Silicon

Autor: Salvador Dueñas, Helena Castán, Héctor Garcia, Luis Bailón, Kaupo Kukli, Mikko Ritala, Markku Antero Leskelä

Publikováno v: University of Helsinki

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::30f62db41925b0060678c34774b6a377
https://researchportal.helsinki.fi/en/publications/30ca076c-4884-4543-abf5-d6944b60f517

One-step electrodeposition of Cu2-xSe and CuInSe2 thin films by the induced co-deposition mechanism

Autor: Marianna Kemell, Mikko Kalervo Ritala, Saloniemi, H., Markku Antero Leskelä, Timo Sajavaara, Eero Rauhala

Publikováno v: University of Helsinki

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::25e848b792da2872ddb6d80645bbeb3b
https://researchportal.helsinki.fi/en/publications/fac763db-e583-4fbe-aa34-07102cce21f9