Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Mark L. Raphaelian"'
Autor:
Mark L. Raphaelian, Daniel M. Dzenitis, Sean T. Littleton, Anthony A. Mazotti, Franz A. Weber
Publikováno v:
14th International Particle Accelerator Conference - IPAC'23 7 - 12 May 2023 Venice Italy https://www.ipac23.org.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d529314ad785b5903811ad6921c3c86f
https://doi.org/10.2172/1970147
https://doi.org/10.2172/1970147
Publikováno v:
Hard X-Ray, Gamma-Ray, and Neutron Detector Physics XXIII.
Electron-based diagnostics at the National Ignition Facility use Sandia’s Icarus sensors for ultrafast imaging. However, the electron detection performance of these sensors has remained mostly unknown. Previous work characterized the singulated Com
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d875948581a6caa4ceb80663f5916de8
https://doi.org/10.1117/12.2594346
https://doi.org/10.1117/12.2594346
Publikováno v:
SPIE Proceedings.
Over the past several years, advanced photolithography has moved from 0.35 micrometers technology to 0.25 micrometers as the standard. Soon the technology will move into the 0.18 micrometers generation. Due to the ever-shrinking feature sizes on adva
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ffe8b037a8bdfd75dc77df1c89b0fb3b
https://doi.org/10.1117/12.328841
https://doi.org/10.1117/12.328841
Publikováno v:
SPIE Proceedings.
This paper addresses the capabilities of the Micrion 8000 FIB (focused ion beam) phase shift mask repair tool to repair clear defects and opaque defects found on chrome-based binary and attenuated phase shift masks, and MoSi-based attenuated phase sh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::161220bcba53c0cd88bed9214032f981
https://doi.org/10.1117/12.277283
https://doi.org/10.1117/12.277283
Autor:
Diane K. Stewart, David C. Ferranti, J. David Casey, Andrew F. Doyle, John C. Morgan, Mark L. Raphaelian
Publikováno v:
SPIE Proceedings.
The characteristics of an ideally repaired opaque defect on a molybdenum silicide (MoSi a O b N c ) photomask are: a. the total removal of the MoSi a O b N c defect, leaving no residual MoSi a O b N c ; b. a smooth, level quartz surface (no over-etch
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cdb5ded33ad629f52ec73c538f869df7
https://doi.org/10.1117/12.301221
https://doi.org/10.1117/12.301221
Autor:
J. David Casey, Mark L. Raphaelian, K. Rose, Roy White, M. F. Ellis, Diane K. Stewart, David C. Ferranti, Andrew F. Doyle, Joshua Lessing, Don Carolan
Publikováno v:
SPIE Proceedings.
On the standard Micrion 8000 PM Repair System platform, the repair accuracy for clear defect repair and opaque defect repair is plus or minus 75 nm. Incorporation of a new ion beam column has pushed the repair accuracy for clear and opaque defect rep
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e75f56e92c567911f0f53c0599e36155
https://doi.org/10.1117/12.301220
https://doi.org/10.1117/12.301220
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