Zobrazeno 1 - 10
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pro vyhledávání: '"Mark E. Mason"'
Autor:
Mark E. Mason, Stephen A. Schendel
Publikováno v:
Clinics in Plastic Surgery. 24:489-505
Adverse outcomes in orthognathic surgery include both functional and aesthetic components that frequently coexist. Reasons for this occurrence are multifactorial and can be classified in broad categories of diagnosis, treatment planning, technical ex
Autor:
John L. Sturtevant, Mark E. Mason
Publikováno v:
Design for Manufacturability through Design-Process Integration VII.
Autor:
Mark E. Mason, Stephen A. Schendel
Publikováno v:
Oral and Maxillofacial Surgery Clinics of North America. 8:95-110
Autor:
Mark E. Mason
Publikováno v:
2012 Symposium on VLSI Technology (VLSIT).
Progress evidenced by Moore's Law has driven increased performance at decreased cost per function. Often, the price of this progress is balanced against complexity and time-to-market (both directly impacting cost). Design enablement teams must mitiga
Autor:
Mark E. Mason
Publikováno v:
Design for Manufacturability through Design-Process Integration VI.
This PDF file contains the front matter associated with SPIE Proceedings Volume 8327, including the Title Page, Copyright information, Table of Contents, and the Conference Committee listing.© (2012) COPYRIGHT Society of Photo-Optical Instrumentatio
Autor:
Yajun Ran, Mark E. Mason, Anand Rajaram, Robert Ritchie, Philippe Hurat, Bala Kasthuri, Nishath Verghese, Clive Bittlestone, Haizhou Chen, Arjun Rajagopal, Raguram Damodaran, Jac Condella, Mark Terry, Srinivas Swaminathan, Frank Cano
Publikováno v:
SPIE Proceedings.
The impact of lithography-induced systematic variations on the parametric behavior of cells and chips designed on a TI 65nm process has been studied using software tools for silicon contour prediction, and design analysis from contours. Using model-b
Publikováno v:
SPIE Proceedings.
As a preliminary step towards Model-Based Process Window OPC we have analyzed the impact of correcting post-OPC layouts using rules based methods. Image processing on the Brion Tachyon was used to identify sites where the OPC model/recipe failed to g
Autor:
Mark E. Mason
Publikováno v:
2007 IEEE Symposium on VLSI Technology.
Design for manufacturability (DFM) is a broadly used term that can be applied to many yield-related activities in the semiconductor industry. However, recent focus in the industry has centered on managing the impact of the increasing complexity of li
Autor:
Mu Feng, Rongchun Zhou, Bill Dostalik, Gary Zhang, Simon Chang, George Lu, Robert A. Soper, T.J. Aton, Stefan Hunsche, Mark Terry, Mark E. Mason, Shane Best, Jim Burdorf, Jiang Wei Li
Publikováno v:
SPIE Proceedings.
Pushing optical microlithography towards the 32nm node requires hyper-NA immersion optics in combination with advanced illumination, polarization, and mask technologies. Novel approaches in model-based optical proximity correction (OPC) and sub-resol