Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Mark A. Gesley"'
Publikováno v:
Label-free Biomedical Imaging and Sensing (LBIS) 2019.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bc66ce38cab45ba7aed51422ae2aedba
https://doi.org/10.1117/12.2507474
https://doi.org/10.1117/12.2507474
Autor:
Juan R. Maldonado, B. DeVore, M. R. Scheinfein, Douglas E. Holmgren, Bassam Shamoun, Timothy N. Thomas, Xiaolan Chen, Mark A. Gesley, Ming Yu, Steven T. Coyle
Publikováno v:
SPIE Proceedings.
A raster multibeam lithography tool is in Etec’s roadmap to meet the stringent requirements of sub 100 nm mask fabrication. The tool leverages the long experience obtained with the ALTA laser pattern generators and the high resolution capabilities
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8084da8e6d6fc42ab11a3db7118442a8
https://doi.org/10.1117/12.512863
https://doi.org/10.1117/12.512863
Autor:
Frederick Raymond, B.J. Marleau, Frank E. Abboud, Mark A. Gesley, Tom Newman, Olivier Toublan, Jan M. Chabala
Publikováno v:
SPIE Proceedings.
MEBESR 50 kV mask pattern generators use Raster GraybeamTM writing, providing an effective grid that is 32X finer than the print grid. The electron beam size and print pixel size are variable between 60 nm and 120 nm, allowing a tradeoff between reso
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::872d1f99fae35eebf19c496c964afda8
https://doi.org/10.1117/12.474514
https://doi.org/10.1117/12.474514
Publikováno v:
SPIE Proceedings.
It is commonly accepted in the semiconductor industry that optical lithography will be the most cost-effective solution for 150 nm and 130 nm device generations. Some selected layers at the 130 nm device generation may be produced using electron-beam
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3755f1573b8f5bde337f78ce96aa264f
https://doi.org/10.1117/12.309577
https://doi.org/10.1117/12.309577
Autor:
Frederick Raymond, Ulrich Hofmann, John Raphael, W. Eckes, Robert L. Dean, Charles A. Sauer, Frank E. Abboud, Wayne Phillips, M. Pastor, Janine J. Doering, Mark A. Gesley, Robert J. Naber, Terry Mulera
Publikováno v:
SPIE Proceedings.
Etec Systems, Inc. has developed a new e-beam mask lithography system, the MEBES 4500S, featuring a higher productivity writing strategy called multipass gray and a number of mechanical and electrical improvements. This new system, based on the prove
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64b339873ea414929f5b4ca9c23521dc
https://doi.org/10.1117/12.277295
https://doi.org/10.1117/12.277295
Autor:
Zoilo C. H. Tan, Terry Mulera, C. Nurmi, Mark A. Gesley, J. Radley, Allan L. Sagle, Lee H. Veneklasen, Keith P. Standiford, John R. Thomas
Publikováno v:
SPIE Proceedings.
Performance data from a prototype 50 kV shaped electron-beam (e-beam) pattern generator is presented. This technology development is targeted towards 180-130 nm device design rules. It will be able to handle 1X NIST X-ray membranes, glass reduction r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::830734a21c70e03db248532374cd0e41
https://doi.org/10.1117/12.209157
https://doi.org/10.1117/12.209157
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22:3025
A unique approach to photocathode operation is described in this article. We utilize a relatively large bandgap CsBr photocathode material that under normal conditions would not photoemit with radiation energy less than the bandgap plus the work func
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5ddb364ac7eaf515135861919a55e2e
https://doi.org/10.1116/1.1823433
https://doi.org/10.1116/1.1823433
Autor:
Steven T. Coyle, Bassam Shamoun, B. DeVore, X. Chen, M. R. Scheinfein, D. Holmgren, Timothy N. Thomas, Juan R. Maldonado, Ming Yu, Mark A. Gesley
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22:501
A prototype raster multibeam optics is evaluated for 45 nm mask pilot lithography. A laser beam is split into 32 beamlets, which are modulated acousto-optically then focused onto a photocathode. This generates 32 electron beams which are scanned and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cc06795596fe1de252cf1083affd2f2b
https://doi.org/10.1116/1.1645885
https://doi.org/10.1116/1.1645885
Autor:
Steven T. Coyle, A. Sagle, Bassam Shamoun, Juan R. Maldonado, D. Holmgren, X. Chen, Mark A. Gesley, Timothy N. Thomas, P. Allen
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20:2657
A prototype raster multibeam lithography tool was constructed and is being evaluated for use as a mask writer at the 50 nm node. The photocathode illumination module (PIM) focuses a linear brush of 32 individually modulated laser beams into 300 nm fu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5e6eec106a7154923825e1dbecf07305
https://doi.org/10.1116/1.1520574
https://doi.org/10.1116/1.1520574
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 16:3563
Critical dimension (CD) control for isolated lines has been experimentally studied as a function of aerial image slope and proximity effects on a photomask. The aerial image slope was controlled by defocusing a 50 kV shaped beam. Isolated crosses of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21d931d2ac106ac78e46ddc18d880e7f
https://doi.org/10.1116/1.590307
https://doi.org/10.1116/1.590307