Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Marja-Leena Kääriäinen"'
Autor:
Johan Boetker, Steven M. George, Cosima Hirschberg, Jukka Rantanen, Nikolaj Sølvkær Jensen, Changquan Calvin Sun, Jens Risbo, Pekka Hoppu, Tommi Kääriäinen, Marja-Leena Kääriäinen, Matti Murtomaa, Anders Ø. Madsen
Publikováno v:
Organic Process Research & Development. 23:2362-2368
The particulate properties of a material after primary manufacturing have a large impact on the secondary manufacturing processes. Especially, powder characteristics leading to poor flowability are...
Autor:
Marja-Leena Kääriäinen, David Campbell Cameron, Marianna Kemell, Jouni Hirvonen, Tommi Kääriäinen, Markku Leskelä, Luis M. Bimbo, Pekka Hoppu, Steven M. George, Hélder A. Santos, Alexandra Correia, Marko Vehkamäki, Mikko Ritala
Publikováno v:
International Journal of Pharmaceutics. 525:160-174
Organic solid pharmaceutical powders are used for the preparation of various drug dosage forms. Primary particles in powder form undergo several processing steps first in pharmaceutical formulations followed by pharmaceutical manufacturing to final d
Autor:
Riikka L. Puurunen, Mikhail Chubarov, Tommi Kääriäinen, Cheol Seong Hwang, Çaǧla Özgit-Akgün, Geert Rampelberg, Erwan Rauwel, Rong Chen, Anjana Devi, David Campbell Cameron, Thomas E. Seidel, Jussi Lyytinen, Liliya Elnikova, A. A. Malkov, Markku Leskelä, Georgi Popov, Henrik Pedersen, Tanja Kallio, A. Outi I. Krause, Jaana Kanervo, Jakob Kuhs, Tobias Törndahl, Gloria Gottardi, A. A. Malygin, Nathanaelle Schneider, Fred Roozeboom, Małgorzata Norek, Marja-Leena Kääriäinen, Adam A. Łapicki, Dohan Kim, Irina Kärkkänen, Fabien Piallat, Harri Lipsanen, Esko Ahvenniemi, Oili Ylivaara, Lev Klibanov, Jyrki Molarius, Claudia Wiemer, Shih Hui Jen, J. Ruud van Ommen, Andrew R. Akbashev, Kestutis Grigoras, Dmitry Suyatin, Christian Militzer, Yury Koshtyal, Hele Savin, Jonas Sundqvist, Timo Sajavaara, Luca Lamagna, Véronique Cremers, Stefan Ivanov Boyadjiev, Mikhail Panov, Saima Ali, Oksana Yurkevich, Dennis M. Hausmann, Ivan Khmelnitskiy, Hossein Salami, Viktor Drozd, Mikhael Bechelany, Robin H. A. Ras, Abdelkader Mennad, Maria Berdova
Publikováno v:
Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films, 35(1)
Journal of Vacuum Science and Technology A
Journal of Vacuum Science and Technology A, American Vacuum Society, 2017, 35 (1), ⟨10.1116/1.4971389⟩
Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 35(1):010801, 1-13. AVS Science and Technology Society
Ahvenniemi, E, Akbashev, A, Ali, S, Bechelany, M, Berdova, M, Boyadjiev, S, Cameron, D, Chen, R, Chubarov, M, Cremers, V, Devi, A, Drozd, V, Elnikova, L, Gottardi, G, Grigoras, K, Hausmann, D, Hwang, C S, Jen, S-H, Kallio, T, Kanervo, J, Khmelnitskiy, I, Kim, D H, Klibanov, L, Koshtyal, Y, Krause, O, Kuhs, J, Kärkkänen, I, Kääriäinen, M-L, Kääriäinen, T, Lamagna, L, Lapicki, A, Leskelä, M, Lipsanen, H, Lyytinen, J, Malkov, A, Malygin, A, Mennad, A, Militzer, C, Molarius, J, Norek, M, Özgit-Akgün, Ç, Panov, M, Pedersen, H, Piallat, F, Popov, G, Puurunen, R, Rampelberg, G, Ras, R H A, Rauwel, E, Roozeboom, F, Sajavaara, T, Salami, H, Savin, H, Schneider, N, Seidel, T E, Sundqvist, J, Suyatin, D, Törndahl, T, van Ommen, J R, Wiemer, C, Ylivaara, O & Yurkevich, O 2017, ' Review Article: Recommended reading list of early publications on atomic layer deposition : Outcome of the "Virtual Project on the History of ALD" ', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 35, no. 1, 010801 . https://doi.org/10.1116/1.4971389
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2, 35
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A, 2017, 35 (1), ⟨10.1116/1.4971389⟩
Journal of Vacuum Science and Technology A
Journal of Vacuum Science and Technology A, American Vacuum Society, 2017, 35 (1), ⟨10.1116/1.4971389⟩
Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 35(1):010801, 1-13. AVS Science and Technology Society
Ahvenniemi, E, Akbashev, A, Ali, S, Bechelany, M, Berdova, M, Boyadjiev, S, Cameron, D, Chen, R, Chubarov, M, Cremers, V, Devi, A, Drozd, V, Elnikova, L, Gottardi, G, Grigoras, K, Hausmann, D, Hwang, C S, Jen, S-H, Kallio, T, Kanervo, J, Khmelnitskiy, I, Kim, D H, Klibanov, L, Koshtyal, Y, Krause, O, Kuhs, J, Kärkkänen, I, Kääriäinen, M-L, Kääriäinen, T, Lamagna, L, Lapicki, A, Leskelä, M, Lipsanen, H, Lyytinen, J, Malkov, A, Malygin, A, Mennad, A, Militzer, C, Molarius, J, Norek, M, Özgit-Akgün, Ç, Panov, M, Pedersen, H, Piallat, F, Popov, G, Puurunen, R, Rampelberg, G, Ras, R H A, Rauwel, E, Roozeboom, F, Sajavaara, T, Salami, H, Savin, H, Schneider, N, Seidel, T E, Sundqvist, J, Suyatin, D, Törndahl, T, van Ommen, J R, Wiemer, C, Ylivaara, O & Yurkevich, O 2017, ' Review Article: Recommended reading list of early publications on atomic layer deposition : Outcome of the "Virtual Project on the History of ALD" ', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 35, no. 1, 010801 . https://doi.org/10.1116/1.4971389
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2, 35
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A, 2017, 35 (1), ⟨10.1116/1.4971389⟩
Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin c
Autor:
David Campbell Cameron, Minna Pirilä, Piia Juholin, Marja-Leena Kääriäinen, Markus Riihimäki, Junkal Landaburu Aguirre, Tapio Fabritius, Rafal Sliz, Riitta L. Keiski
In this study, commercial nanofiltration (NF270 and NF90, Dow Filmtec) and zinc oxide (ZnO) coated NF270 nanofiltration membranes prepared by atomic layer deposition (ALD) were applied to the purification of mine wastewaters. The characteristics of t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a0073c2499c20da1e37b0061484b33fd
Autor:
Ronny Brandenburg, Marja-Leena Kääriäinen, Michael Schmidt, Cornelia Irimiea, David Cameron, Tomasz Jakubowski, Marcin Holub, Michal Bonislawski, Eugen Stamate, Indrek Jõgi
Publikováno v:
Fuel. 144:137-144
Direct and indirect plasma oxidation of NO x was tested in a medium-scale test-bench at gas flows of 50 slm (3 m 3 /h). For direct plasma oxidation the synthetic flue gas was directed through a stacked DBD reactor. For indirect plasma oxidation, a DB
Autor:
Marja-Leena Kääriäinen, David Cameron
Publikováno v:
Thin Solid Films. 526:212-217
Titanium dioxide films have been created by atomic layer deposition using titanium chloride as the metal source and a solution of ammonium hydroxide in water as oxidant. Ammonium hydroxide has been used as a source of nitrogen for doping and three th
Autor:
David Cameron, Marja-Leena Kääriäinen
Publikováno v:
Surface Science. 606:L22-L25
In this paper, undoped polycrystalline titanium dioxide films have been deposited by atomic layer deposition (ALD) using the titanium tetrachloride–water process. These films have been anatase, rutile, or mainly anatase with a varying content of ru
Publikováno v:
Surface and Coatings Technology. 205:S475-S479
The inhomogeneous and hydrophobic surface characteristics of many polymers can be incompatible with other substances which are required for their further functionalization. Various plasma methods have been used to overcome this problem and to enable
Autor:
Pasi Jalkanen, Pasi Myllyperkiö, Marja-Leena Kääriäinen, Tommi Kääriäinen, Konstantin Arutyunov, Jouko Korppi-Tommola, Liisa J. Antila, Sampo Kulju, Teemu O. Ihalainen
Publikováno v:
Thin Solid Films. 519(11):3835-3839
Simple vacuum evaporation technique for deposition of dyes on various solid surfaces has been developed. The method is compatible with conventional solvent-free nanofabrication processing enabling fabrication of nanoscale optoelectronic devices. Thin
Publikováno v:
Thin Solid Films. 517:6666-6670
Atomic Layer Deposition has been used to deposit titanium dioxide thin films on soda-lime glass substrates. A series of films with thicknesses from 2.6 to 260 nm has been created and the film structure has been studied with X-ray diffraction. It has