Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Mariya Ponomarenko"'
Autor:
Ju Hee Shin, Eric Janda, Cedric Affentauschegg, Young-Seog Kang, Stefan Cornelis Theodorus Van Der Sanden, Young-Sin Choi, YoungSun Nam, Bernd Geh, Jang-Sun Kim, Jan Baselmans, Oh-Sung Kwon, Mariya Ponomarenko, Young Ha Kim, Hunhwan Ha, Rob W. van der Heijden, Daan Slotboom, Umar H. Rizvi
Publikováno v:
SPIE Proceedings.
In this paper we present the limitations of 3rd order distortion corrections based on standard overlay metrology and propose a new method to quantify and correct the cold-lens aberration fingerprint. As a result of continuous shrinking features of th
Autor:
Remco Dirks, Ethan Chiu, Henk Niesing, Baukje Wisse, Stefan Geerte Kruijswijk, Reinder Teun Plug, Bijoy Rajasekharan, Mariya Ponomarenko, Sylvia Yuan, Marlene Strobl, Platt Hung, Noelle Wright, Wilhelm Tsai, Vincent Couraudon, David Huang, Thomas M. Chen, Henry Chen, Paul K. L. Yu, Yi Song, Frida Liang, Andy Lan, Alan Wang, Wilson Hsu, Hugo Augustinus Joseph Cramer
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
Integrated metrology in the lithography cluster is a promising solution to tighten process control. It is shown that optical CD metrology using YieldStar, an angular resolved scatterometer, meets all requirements in terms of precision, process robust
Autor:
Shaunee Cheng, Peter Vanoppen, David Laidler, Philippe Leray, Mariya Ponomarenko, Andreas Fuchs, Martyn Coogans, Maurits van der Schaar
Publikováno v:
SPIE Proceedings.
Diffraction Based Overlay (DBO) metrology has been shown to have significantly reduced Total Measurement Uncertainty (TMU) compared to Image Based Overlay (IBO), primarily due to having no measurable Tool Induced Shift (TIS). However, the advantages