Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Mariusz Bester"'
Autor:
Grzegorz Wisz, Paulina Sawicka-Chudy, Maciej Sibiński, Rostyslav Yavorskyi, Mirosław Łabuz, Dariusz Płoch, Mariusz Bester
Publikováno v:
Materials, Vol 16, Iss 16, p 5683 (2023)
According to increasing demand for energy, PV cells seem to be one of the best answers for human needs. Considering features such as availability, low production costs, high stability, etc., metal oxide semiconductors (MOS) are a focus of attention f
Externí odkaz:
https://doaj.org/article/4bd0b3f50faf40e1909cfe4f2c66a989
Autor:
Grzegorz Wisz, Paulina Sawicka-Chudy, Andrzej Wal, Maciej Sibiński, Piotr Potera, Rostyslaw Yavorskyi, Lyubomyr Nykyruy, Dariusz Płoch, Mariusz Bester, Marian Cholewa, Olena M. Chernikova
Publikováno v:
Applied Sciences, Vol 13, Iss 6, p 3613 (2023)
The problem of copper diffusion in semiconductor devices has been known for several decades as copper has been used as an interconnecting (bonding) metal and has been intensively studied due to its high diffusion coefficient. The influence of the int
Externí odkaz:
https://doaj.org/article/0caec9dca02d4eb7af65df6181152fb9
Autor:
Grzegorz Wisz, Paulina Sawicka-Chudy, Maciej Sibiński, Dariusz Płoch, Mariusz Bester, Marian Cholewa, Janusz Woźny, Rostyslav Yavorskyi, Lyubomyr Nykyruy, Marta Ruszała
Publikováno v:
Nanomaterials, Vol 12, Iss 8, p 1328 (2022)
In this study, titanium dioxide/copper oxide thin-film solar cells were prepared using the reactive direct-current magnetron sputtering technique. The influence of the deposition time of the top Cu contact layer on the structural and electrical prope
Externí odkaz:
https://doaj.org/article/f7ccd127d4cb4c05be60f732667131cd
Autor:
Grzegorz, Wisz, Paulina, Sawicka-Chudy, Maciej, Sibiński, Dariusz, Płoch, Mariusz, Bester, Marian, Cholewa, Janusz, Woźny, Rostyslav, Yavorskyi, Lyubomyr, Nykyruy, Marta, Ruszała
Publikováno v:
Nanomaterials (Basel, Switzerland). 12(8)
In this study, titanium dioxide/copper oxide thin-film solar cells were prepared using the reactive direct-current magnetron sputtering technique. The influence of the deposition time of the top Cu contact layer on the structural and electrical prope
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::748ac1c8b979c94c75968cfceddc1b26
https://pubmed.ncbi.nlm.nih.gov/35458036
https://pubmed.ncbi.nlm.nih.gov/35458036