New insights into thermomechanical behavior of GeTe thin films during crystallization

Autor: S. Escoubas, Mathieu Bernard, Cristian Mocuta, N. Burle, Pierre Noé, Olivier P. Thomas, Rebbeca R. Chahine, M. Amara, Philippe Kowalczyk, C. Guichet, Magali Putero, Marion Gallard, Marie-Ingrid Richard

Publikováno v: Acta Materialia
Acta Materialia, 2020, 191, pp.60-69. ⟨10.1016/j.actamat.2020.04.001⟩
Acta Materialia, Elsevier, 2020, 191, pp.60-69. ⟨10.1016/j.actamat.2020.04.001⟩

International audience; In this work, we reexamine Ge rejection in Ge-rich GeTe thin films with a slight deviation from stoichiometry using a unique combination of in situ measurements: curvature and x-ray diffraction as well as electrical resistance

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::12fc61580c49e4e52e0c057ceeb9b7f1
https://hal.science/hal-02903073