Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Marion Fink"'
Publikováno v:
Forests, Vol 15, Iss 1, p 24 (2023)
Due to land use change, green alder (Alnus alnobetula), formerly restricted to moist slopes, is now expanding to drier sun-exposed sites at the alpine treeline. The highly productive shrub is forming closed thickets, establishing nitrogen-saturated s
Externí odkaz:
https://doaj.org/article/757d3de31b7a4d5bad943fb8cd207f8c
Autor:
Joo Yeon Kim, Vahid Fakhfouri, Karl Pfeiffer, Anja Voigt, Marion Fink, Gabi Gruetzner, Juergen Brugger
Publikováno v:
NIP & Digital Fabrication Conference. 25:803-805
Autor:
Marion Fink
Publikováno v:
KURT 3: Jahrbuch der Hochschule für Gestaltung und Kunst Basel-HGK FHNW
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::086b2c15ab98a604cc0e8fa3aa383c4f
https://doi.org/10.1515/9783034609074.20
https://doi.org/10.1515/9783034609074.20
Publikováno v:
SPIE Proceedings.
We report the new epoxy-based curing resist mr-NIL 6000 designed for thermal NIL, where the curing reaction is initiated by UV exposure and concurrently occurs at elevated temperature, both preferably in the imprint machine. Especially for the applic
Autor:
Marion Fink, Anna Klukowska, Ruth Houbertz, Ute Ostrzinski, Gabi Gruetzner, Karl Pfeiffer, Herbert Wolter, Roland Himmelhuber
Publikováno v:
SPIE Proceedings.
The handling of a continuously increasing amount of data leads to a strong need for high-speed short-range connections. Conventional Cu technology between chips on a board is limited. Optical interconnects will dominate the market, since they can ove
Autor:
Gabi Gruetzner, Marion Fink, Marko Vogler, Juergen Grimm, Freimut Reuther, C. Schuster, Andi Kaeppel, Mike Kubenz
Publikováno v:
SPIE Proceedings.
Prepolymers formed from multifunctional allyl monomers can beneficially used in nanoimprint lithography (NIL), since they cure as a consequence of heating during the imprint process. Thus they have the potential to enable NIL at comparatively low tem
Autor:
Marion Fink, Thomas Glinsner, Z. E. Berrada, R. Jerzy, N. Bogdanski, Freimut Reuther, Hella-Christin Scheer, M. Wissen
Publikováno v:
SPIE Proceedings.
Pattern replication into curable imprint resists by hot embossing offers the opportunity to use the replication after crosslinking as a working-stamp. The replications of a 4” Si stamp into the thermoset imprint polymer mr-I 9000R-XP with a commerc
Autor:
Patrick Carlberg, Gabi Gruetzner, Freimut Reuther, Karl Pfeiffer, Marion Fink, Lars Montelius
Publikováno v:
SPIE Proceedings.
To utilize the potential of nanoimprint lithography (NIL) you need polymers, which give relief patterns with good thermal and etch resistance, a necessity for subsequent process steps. Thermoplastic polymers with high thermal stability require high i
Publikováno v:
Emerging Lithographic Technologies VI.
In order to reduce the cost for stamps featuring nanometer structures in a hot embossing lithography (HEL) process the production and performance of working stamps made of thermoset polymer are of interest. Fabrication of stamps made of thermosetting