Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Marieke van Veen"'
Autor:
Guillaume Mernier, Danielle Palmen, Nicole Schoumans, Marieke van Veen, Rasmus Nielsen, Jan Baselmans
Publikováno v:
Optical and EUV Nanolithography XXXV.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c5ae22ee0741774c8f75bf91158d2cff
https://doi.org/10.1117/12.2613333
https://doi.org/10.1117/12.2613333
Publikováno v:
SPIE Proceedings.
In our study we have investigated the mask 3D impact on best focus (BF) shifts, which may occur on more complex 2D patterns, by looking at simplified line/space test patterns at various pitches. Several test masks were created; with different absorbe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::011d94eb6e0c882d56006517f5e5aeba
https://doi.org/10.1117/12.2068155
https://doi.org/10.1117/12.2068155
Autor:
Steve Hansen, Igor Bouchoms, Melchior Mulder, Jörg Zimmermann, Anthony Ngai, Marieke van Veen, Anita Bouma, Andre Engelen
Publikováno v:
SPIE Proceedings.
The practical limit of NA using water as immersion liquid has been reached. As a consequence, the k1 in production for the coming technology nodes will decrease rapidly, even below k1=0.25.This means that new imaging solutions are required. Double pa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07cfaf12daa434f3440a65e83f7d781a
https://doi.org/10.1117/12.814155
https://doi.org/10.1117/12.814155
Autor:
Jan Mulkens, Richard Moerman, Roelof de Graaf, Herman Boom, Patrick Thomassen, Paul Liebregts, Frank Bernhard Sperling, Marieke van Veen, Igor Bouchoms, Andre Engelen, Wolfgang Emer
Publikováno v:
SPIE Proceedings.
Immersion lithography started to become the main workhorse for volume production of 45-nm devices, and while waiting for EUV lithography, immersion will continue to be the main technology for further shrinks. In a first step single exposure can be st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2caf32fc1262769adaa00faa38de7a01
https://doi.org/10.1117/12.813649
https://doi.org/10.1117/12.813649