Zobrazeno 1 - 10
of 113
pro vyhledávání: '"Marie Angelopoulos"'
Autor:
Brian C. Trinque, Tengjiao Hu, Ronald L. Jones, Marie Angelopoulos, C. Grant Willson, Dario L. Goldfarb, Wen-Li Wu, Michael D. Stewart, Eric K. Lin, Gerard M. Schmid
Publikováno v:
Journal of Polymer Science Part B: Polymer Physics. 42:3063-3069
The requirement of nanometer dimensional control in photolithographic patterning underlies the future of emerging technologies, including next-generation semiconductors, nanofluids, photonics, and microelectromechanical systems. For chemically amplif
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2feaad0a254caedce65496fcb9e7964
https://doi.org/10.1002/polb.20168
https://doi.org/10.1002/polb.20168
Autor:
Jack F. Douglas, Ronald L. Jones, D M. Goldfarb, Eric K. Lin, Wen-Li Wu, Christopher L. Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Marie Angelopoulos
Publikováno v:
Journal of Applied Physics. 93:1978-1986
Elastic incoherent neutron scattering is employed to parameterize changes in the atomic/molecular mobility in lithographic polymers as a function of film thickness. Changes in the 200 MHz and faster dynamics are estimated in terms of a harmonic oscil
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d842685b972602e8bdfa6e58a727d883
https://doi.org/10.1063/1.1539538
https://doi.org/10.1063/1.1539538
Autor:
Wu-Song Huang, Karen Petrillo, Arpan P. Mahorowala, Ranee Wai-Ling Kwong, Marie Angelopoulos, Wayne M. Moreau, C. R. Guarnieri, Arieh Aviram, David R. Medeiros, Christopher Magg
Publikováno v:
IBM Journal of Research and Development. 45:639-650
Resists for advanced mask-making with high-voltage electron-beam writing tools have undergone dramatic changes over the last three decades. From PMMA and the other early chain-scission resists for micron dimensions to the aqueous-base-developable, dr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7051ee3c63640bf4829c87564e5044bd
https://doi.org/10.1147/rd.455.0639
https://doi.org/10.1147/rd.455.0639
Autor:
Marie Angelopoulos
Publikováno v:
IBM Journal of Research and Development. 45:57-75
Conjugated polymers in the nondoped and doped conducting state have an array of potential applications in the microelectronics industry. Conducting polymers are effective discharge layers as well as conducting resists in electron beam lithography, fi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7e439ce4b652db5d014e5ebd84b27eba
https://doi.org/10.1147/rd.451.0057
https://doi.org/10.1147/rd.451.0057
Autor:
R. Sooriyakumaran, James W. Taylor, John P. Simons, Marie Angelopoulos, G. W. Reynolds, Arpan P. Mahorowala, D. R. Medeiros, K. Petrillo, D. Hofer, Katherina Babich, Qinghuang Lin
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 18:1411-1419
Thin film imaging offers the possibility of extending 248 nm lithography to sub 150 nm resolution. We have been working on a 248 nm bilayer imaging scheme which utilizes a thin Si-containing resist on top of a thick, planarizing underlayer. The image
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ad724955b4eadb1343e7efdf1277a648
https://doi.org/10.1116/1.582363
https://doi.org/10.1116/1.582363
Autor:
Gregory Breyta, R. Sooriyakumaran, Carl E. Larson, Qinghuang Lin, Karen Petrillo, Marie Angelopoulos, Juliann Opitz, Gregory M. Wallraff, D. LaTulip, Katherina Babich, John P. Simons, R. A. Dipietro, Mark H. Sherwood, Donald C. Hofer, Debra Fenzel-Alexander, J. Muete
Publikováno v:
Journal of Photopolymer Science and Technology. 11:673-679
Thin film imaging resists (TSI and Bilayer systems) confine the imaging to a thin resist film (in the case of a bilayer system) which is subsequently transferred to a thicker polymeric underlayer. This approach has a number of potential advantages in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e7f8debc9c158a786adb50850114d5d5
https://doi.org/10.2494/photopolymer.11.673
https://doi.org/10.2494/photopolymer.11.673
Publikováno v:
Journal of The Electrochemical Society. 144:436-442
This study examines the use of spin-applied conjugated polymers such as polyanilines for corrosion and dissolution protection of silver and copper. In particular, attention is given to the protection that these polymers provide under conditions of an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3156408e850d63d45773657b0751e498
https://doi.org/10.1149/1.1837428
https://doi.org/10.1149/1.1837428
Publikováno v:
Macromolecules. 29:3046-3049
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5f787b3d22c22150d897a9bd603dc43e
https://doi.org/10.1021/ma951647k
https://doi.org/10.1021/ma951647k
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 33:2725-2729
Poly(aniline-co-phenetidine)s were synthesized by the copolymerization of aniline and o-phenetidine (o-ethoxyaniline). The molar feed ratio of the starting aniline monomers was varied to result in copolymers with different compositions. The actual co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::84fc4c9eed80357fc7d2073e9bd2c736
https://doi.org/10.1002/pola.1995.080331606
https://doi.org/10.1002/pola.1995.080331606
Publikováno v:
Synthetic Metals. 55:1552-1557
Amic acids are found to be dopants for polyaniline (Pani). In particular, polyamic acids, the precursors to polyimides, react with Pani to form an all-polymer conducting matrix composed of protonated Pani and the polyamate counteranion. The acid/base
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a74fde5085995de413747d4ca238301
https://doi.org/10.1016/0379-6779(93)90283-3
https://doi.org/10.1016/0379-6779(93)90283-3