Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Marian Precner"'
Autor:
Ján Kuzmík, Ondrej Pohorelec, Stanislav Hasenöhrl, Michal Blaho, Roman Stoklas, Edmund Dobročka, Alica Rosová, Michal Kučera, Filip Gucmann, Dagmar Gregušová, Marian Precner, Andrej Vincze
Publikováno v:
Materials; Volume 16; Issue 6; Pages: 2250
Metal organic chemical vapor deposition was used to grow N-polar In0.63Al0.37N on sapphire substrates. P-doping was provided by a precursor flow of Cp2Mg between 0 and 130 nmol/min, reaching a Cp2Mg/III ratio of 8.3 × 10−3. The grain structure of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8933f770ccd5ad25c9261216739f2d96
https://doi.org/10.3390/ma16062250
https://doi.org/10.3390/ma16062250
Autor:
Ivan Kundrata, Maïssa K. S. Barr, Sarah Tymek, Dirk Döhler, Boris Hudec, Philipp Brüner, Gabriel Vanko, Marian Precner, Tadahiro Yokosawa, Erdmann Spiecker, Maksym Plakhotnyuk, Karol Fröhlich, Julien Bachmann
Publikováno v:
Small Methods. 6:2270028
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bfe52ad361b81b580cf6bfa2cd1795f8
https://doi.org/10.1002/smtd.202270028
https://doi.org/10.1002/smtd.202270028
Autor:
Karol Frohlich, Miroslav Mikolášek, Riyas Subair, Vojtech Nadazdy, Alica Rosová, Marian Precner, Nevin Tasaltin, Elif Alturk, Emine Tekin, Emre Aslan, Tulin Ates Turkmen, Eva Majková
Publikováno v:
ECS Meeting Abstracts. :1144-1144
Atomic layer deposition (ALD) is exceptional deposition technique because it allows for growth of high quality films on large are substrates at low deposition temperatures. In our contribution ALD was employed for preparation of transparent conductin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::476ca761f20ba1319ff79f876f777879
https://doi.org/10.1149/ma2019-02/24/1144
https://doi.org/10.1149/ma2019-02/24/1144
Autor:
Ivan Kundrata, Maïssa K. S. Barr, Sarah Tymek, Dirk Döhler, Boris Hudec, Philipp Brüner, Gabriel Vanko, Marian Precner, Tadahiro Yokosawa, Erdmann Spiecker, Maksym Plakhotnyuk, Karol Fröhlich, Julien Bachmann
Publikováno v:
Small Methods. 6(5):2101546
Additive manufacturing (3D printing) has not been applicable to micro‐ and nanoscale engineering due to the limited resolution. Atomic layer deposition (ALD) is a technique for coating large areas with atomic thickness resolution based on tailored
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b03100156214333355d8062a5dbbaa66