Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Margarita Zakharova"'
Autor:
Andrey Mikhaylov, Jorge Luis Beltran Diaz, Margarita Zakharova, Vitor Vinieska, Daniel Münch, Edwin Fohtung, Sergio Henrique Pezzin, Danays Kunka
Publikováno v:
Nano Trends, Vol 6, Iss , Pp 100035- (2024)
Three-dimensional insights into the microstructure of composite materials are vital for enhancing their performance under operational conditions. Phase-sensitive methods can offer supplementary data, especially for materials with low absorption, comp
Externí odkaz:
https://doaj.org/article/9f5b5edac2844128bbe391f9d7c7c840
Publikováno v:
Journal of Imaging, Vol 7, Iss 11, p 221 (2021)
We present the application of single-shot multicontrast X-ray imaging with an inverted Hartmann mask to the time-resolved in situ visualization of chemical reaction products. The real-time monitoring of an illustrative chemical reaction indicated the
Externí odkaz:
https://doaj.org/article/7ffca6d8f21646d7ae72aa516569e060
Autor:
Marina Ostapenko, Lyudmila Meisner, Aleksandr Lotkov, Ekaterina Gudimova, Margarita Zakharova
Publikováno v:
Известия Томского политехнического университета: Инжиниринг георесурсов, Vol 324, Iss 3 (2019)
The relevance of the research is caused by the increasing interest to application of electron-beam treatment as a means of precise changes of structural and phase states, and the properties of the surface and the surface layers of metallic materials.
Externí odkaz:
https://doaj.org/article/e866d7167ebe4d7c89f6800bff2c3b65
Publikováno v:
Polymers, Vol 12, Iss 10, p 2359 (2020)
Photoresists (or photo-resins) are the main and most important raw material used for lithography techniques such as deep X-ray (DXRL), ultraviolet (UVL), deep-UV (DUVL), and extreme UV (EUVL). In previous work, we showed how complicated could be the
Externí odkaz:
https://doaj.org/article/6065388cda394361902a5ea690524dad
Publikováno v:
Polymers, Vol 11, Iss 9, p 1457 (2019)
One of the types of negative tone photoresists is composed of at least a catalyst, a solvent, and epoxy resin. This is the primary raw material for lithography technology. To ensure high-quality pattern transfer in the lithography process, it is cruc
Externí odkaz:
https://doaj.org/article/be87826b624449f99bbfe2b74859485d
Autor:
Anton Plech, Bärbel Krause, Tilo Baumbach, Margarita Zakharova, Soizic Eon, Caroline Girmen, Gernot Buth, Hartmut Bracht
Publikováno v:
Nanomaterials, Vol 9, Iss 4, p 501 (2019)
High time resolution in scattering analysis of thin films allows for determination of thermal conductivity by transient pump-probe detection of dissipation of laser-induced heating, TDXTS. We describe an approach that analyses the picosecond-resolved
Externí odkaz:
https://doaj.org/article/247a1975fedf40ecaa14af8bb34f8830
Autor:
Margarita Zakharova, Vitor Vlnieska, Heike Fornasier, Martin Börner, Tomy dos Santos Rolo, Jürgen Mohr, Danays Kunka
Publikováno v:
Applied Sciences, Vol 8, Iss 3, p 468 (2018)
Single-shot grating-based phase-contrast imaging techniques offer additional contrast modalities based on the refraction and scattering of X-rays in a robust and versatile configuration. The utilization of a single optical element is possible in such
Externí odkaz:
https://doaj.org/article/3f359e9a37694d568c3f0cffc01f19a7
Publikováno v:
Applied Sciences, Vol 8, Iss 4, p 528 (2018)
The quality of high aspect ratio microstructures fabricated by deep X-ray lithography is highly dependent on the photoresist material used and the process parameters applied. Even with photoresists more suitable to this process, it is common to face
Externí odkaz:
https://doaj.org/article/dd9412291ada4e4aa964ac9f62813bcb
Autor:
Marcus Zuber, Danays Kunka, Sara Ferreira Da Costa, Andrey Mikhaylov, Margarita Zakharova, Sérgio Henrique Pezzin, Tilo Baumbach
Publikováno v:
Nano select, 3 (3), 577-593
This work combines non-destructive X-ray micro-computed tomography (µCT) and scanning electron microscopy (SEM) to study the self-healing triggering mechanism in a system consisting of an epoxy resin, based on diglycidyl ether of bisphenol A, with e
Autor:
Andrey Mikhaylov, Margarita Zakharova, Vitor Vlnieska, Ankita Khanda, Sabine Bremer, Marcus Zuber, Sergio Henrique Pezzin, Danays Kunka
Publikováno v:
Optics express. 30(6)
This paper reports on the fabrication and characterization of an inverted Hartmann mask and its application for multi-contrast X-ray imaging of polymer composite material in a laboratory setup. Hartmann masks open new possibilities for high-speed X-r