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Autor:
Marfe Ma, Kuan Hu, Elven Huang, Xinyi Hu, Zhengfang Liu, Jet Jiang, Chunshan Du, Qijian Wan, Wael ElManhawy, Gavin Li, Frank Hou
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIV.
Silicon weak pattern exploration becomes more and more attractive for yield improvement and design robustness as these proven silicon weak patterns or hotspots directly reveals process weakness and should be avoided to occur on the chip design. At th