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Publikováno v:
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Nitride film LPCVD (Low Pressure Chemical Vapor Deposition) process is well known in semiconductor industry. The paper covers an innovative approach in touching two aspects of improvement in LPCVD nitride process in diffusion furnace. First is the ex
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8df0172126b4131f5e209a02fa528c12
https://doi.org/10.1109/asmc49169.2020.9185301
https://doi.org/10.1109/asmc49169.2020.9185301
