Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Marco Guevremont"'
Publikováno v:
SPIE Proceedings.
The present highly competitive state of the PV industry is putting the pressure on both crystalline and thin film manufactures to deploy advanced architectures as a means to differentiate their products and protect market share. c-Si back side contac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4d06ed5271644ee1e89c3774053f4fda
https://doi.org/10.1117/12.935059
https://doi.org/10.1117/12.935059
Autor:
Thomas Hingst, Thomas Marschner, Manfred Moert, Jan Homilius, Marco Guevremont, John Hopkins, Assim Elazami
Publikováno v:
SPIE Proceedings.
In the production of sub 140nm electronic devices, CD metrology is becoming more critical due to the increased demands placed on process control. CD metrology using CD-SEM is approaching its limits especially with respect to precision, resolution and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::42953e60cd7e64b83e8c97a8efe314f3
https://doi.org/10.1117/12.485011
https://doi.org/10.1117/12.485011
Autor:
Marco Polli, Marco Guevremont, DaniEle Neira, Philippe Thony, David Herisson, Cyril Fernand, Stephanie Kremer, Daniel Henry, Assim Elazami
Publikováno v:
SPIE Proceedings.
Using scatterometry based on Spectroscopic Ellipsometry, a complete study of Gate lithography level measurement on standard products has been conducted. Experiments were done on typical ST batches for 120, 90, and 65 nm nodes. KLA-Tencor SpectraCD SE
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f9eacb4e0813c77c3d87db24b88b71e
https://doi.org/10.1117/12.485031
https://doi.org/10.1117/12.485031
Autor:
Christopher C. Baum, Marco Guevremont, Suresh Lakkapragada, Umar K. Whitney, Kamal N. Bhatia, Vladimir A. Ukraintsev, Mak Kulkarni, Pedro Herrera, Karen H. R. Kirmse
Publikováno v:
SPIE Proceedings.
A systematic study has been conducted to evaluate accuracy and precision of spectral scatterometry used for two-dimensional (2D) characterization of trenches formed in fluorinated silicon glass (FSG). Experiments were done on short-flow dual-damascen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::88f437af04d69cb5a34f0fb75132b81e
https://doi.org/10.1117/12.473457
https://doi.org/10.1117/12.473457
Autor:
John A. Allgair, Lloyd C. Litt, Umar K. Whitney, Mark Drew, Pedro Herrera, Ady Levy, Robert R. Hershey, David C. Benoit, Suresh Lakkapragada, Marco Guevremont
Publikováno v:
SPIE Proceedings.
Smaller device dimensions and tighter process control windows have created a need for CD metrology tools having higher levels of precision and accuracy. Furthermore, the need to detect and measure changes in feature profiles is becoming critical to i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::49ea37cdec4055159bbb39d8cabe0733
https://doi.org/10.1117/12.436771
https://doi.org/10.1117/12.436771