Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Marcel Bontekoe"'
Autor:
Maarten Boogaarts, Young-Jun Kim, Khalid Elbattay, Balaji Rangarajan, Marcel Bontekoe, Andrew Moe, Young Seog Kang, Tony Park, Chung-Yong Kim, Dong Kyung Han, Axel von Sydow, Jeong Heung Kong, Jan-Pieter van Delft, Arjan Donkerbroek, Se Yeon Jang, Jeroen Cottaar, Ruiyue Ouyang, Jin Phil Choi, Jeroen H. G. C. Rutten
Publikováno v:
SPIE Proceedings.
The next generation technology and emerging memory devices require gradually tighter lithographic focus control on imaging critical layers. Especially in case of BEOL process, big PDO (Process Dependent Offset) from large intra-field topography steps
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9be892ab69028b9f590a95af3bf0b343
https://doi.org/10.1117/12.2258184
https://doi.org/10.1117/12.2258184
