Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Marc R. Zuiddam"'
Publikováno v:
Physica E: Low-Dimensional Systems and Nanostructures, 134
Physica E: Low-dimensional Systems and Nanostructures
Physica E: Low-dimensional Systems and Nanostructures
We report on the fabrication of molybdenum (Mo) nanopillar (NP) arrays with NP diameters down to 75 nm by means of deep-reactive ion etching at cryogenic temperatures. A variable-thickness Mo metal layer sputtered onto a Si3N4/Si substrate makes poss
Publikováno v:
Nano Letters. 7:384-388
We show that a nanofluidic device consisting of a solution-filled cavity bounded by two closely spaced parallel electrodes can amplify the electrical current from redox molecules inside the cavity by a factor of approximately 400 through redox cyclin
Publikováno v:
Microelectronic Engineering. 46:435-438
A microfabrication process is described to produce samples with a search pattern that enables finding a small area of interest with Scanning Tunnelling Microscopy (STM). This area is a 100 @mm square membrane, containing 0.6 - 3 @mm square windows wi
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 14:044506
This article reports the results of the fabrication of large arrays of nanopillars for future tribological experiments. This fabrication focused on achieving a constant high aspect ratio up to 1∶24 and a separation between each pair of adjacent pil
Autor:
Pieter J. Lusse, Marc R. Zuiddam, Zvonimir I. Kolar, Gert Frens, Marnix V. ten Kortenaar, Emile van der Drift, Jeroen J. M. de Goeij
Publikováno v:
ChemInform. 32
A new and simple method is described to plate silicon structures with metallic silver for ultralarge-scale integration in dimensions down to 100 nm at an aspect ratio of 4.25. The silver deposition is initiated by an exchange reaction of silicon with
Autor:
B. Ilge, L. J. Geerlings, Marc R. Zuiddam, E. van der Drift, Georgios Palasantzas, Sven Rogge
Publikováno v:
Microelectronic Engineering, 41(10)
This article reports on the technology to link atomic scale structures to macroscopic contact pads. Dedicated processes for electrode pattern formation in several materials have been developed and characterised. For pattern formation in CoSi2 a therm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::61f616ba86e92a0bddab21c258b9e532
https://research.rug.nl/en/publications/b412f004-1a96-4913-9e5d-a4dac20803a5
https://research.rug.nl/en/publications/b412f004-1a96-4913-9e5d-a4dac20803a5
Autor:
Marc R. Zuiddam, Zvonimir I. Kolar, Gert Frens, Emile van der Drift, Jeroen J. M. de Goeij, Pieter J. Lusse, Marnix V. ten Kortenaar
Publikováno v:
Journal of The Electrochemical Society. 148:C28
A new and simple method is described to plate silicon structures with metallic silver for ultralarge-scale integration in dimensions down to 100 nm at an aspect ratio of 4.25. The silver deposition is initiated by an exchange reaction of silicon with
Autor:
B. Q. Dinh, Marc R. Zuiddam, P. A. Verhoeven, E. van der Drift, T. Zijlstra, E. J. M. Fakkeldij
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 15:2676
Reactive ion etching characteristics of chemical vapor deposition-deposited W1−xGex alloys in Cl2, SF6, and SF6/O2/He plasmas were investigated. The interactive role of the germanium component in the overall etch process was unraveled. To this aim
Publikováno v:
Nano Letters; Feb2007, Vol. 7 Issue 2, p384-388, 5p