Zobrazeno 1 - 10
of 131
pro vyhledávání: '"Marc Porti"'
Autor:
Marc Porti, Gerard Palau, Albert Crespo-Yepes, August Arnal Rus, Simon Ogier, Eloi Ramon, Montserrat Nafria
Publikováno v:
Micromachines, Vol 15, Iss 4, p 443 (2024)
Given the current maturity of printed technologies, Organic Thin-Film Transistors (OTFT) still show high initial variability, which can be beneficial for its exploitation in security applications. In this work, the process-related variability and agi
Externí odkaz:
https://doaj.org/article/f135aef7506f4cc9b817766e580d436c
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 6, Pp 55-62 (2018)
Power consumption and Ion/Ioff ratio of an ultra-thin body and buried oxide fully depleted silicon on insulator CMOS inverter circuit has been calculated at near-threshold voltage operation from TCAD simulations. TCAD outputs (current, voltage, and c
Externí odkaz:
https://doaj.org/article/4e78f865fc984c76896d2761118b0be1
Publikováno v:
IEEE Transactions on Nanotechnology. 22:28-35
Autor:
K. Zhang, Xavier Aymerich, Günther Benstetter, Z. Y. Shen, Mario Lanza, V. Iglesias, Marc Porti, Montserrat Nafria, Gennadi Bersuker, A. Bayerl
Publikováno v:
Recercat: Dipósit de la Recerca de Catalunya
Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
Recercat. Dipósit de la Recerca de Catalunya
instname
Dipòsit Digital de Documents de la UAB
Universitat Autònoma de Barcelona
Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
Recercat. Dipósit de la Recerca de Catalunya
instname
Dipòsit Digital de Documents de la UAB
Universitat Autònoma de Barcelona
The evolution of the electrical properties of HfO2/SiO2/Si dielectric stacks under electrical stress has been investigated using atomic force microscope-based techniques. The current through the grain boundaries (GBs), which is found to be higher tha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f2049c7a4f9fe3426c55a54b67eaff67
http://hdl.handle.net/2072/402358
http://hdl.handle.net/2072/402358
Publikováno v:
Dipòsit Digital de Documents de la UAB
Universitat Autònoma de Barcelona
Universitat Autònoma de Barcelona
Capacitive Metal-Insulator-Semiconductor structures with graphene as interfacial layer between the HfO2 dielectric and the top electrode have been fabricated and investigated at device level and at the nanoscale with Conductive Atomic Force Microscop
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7c8020f24934f3d2edaf01aead8c4a44
https://ddd.uab.cat/record/249448
https://ddd.uab.cat/record/249448
Publikováno v:
Dipòsit Digital de Documents de la UAB
Universitat Autònoma de Barcelona
Universitat Autònoma de Barcelona
Two different Kelvin Probe Force Microscopy (KPFM) measurement configurations have been combined to evaluate at the nanoscale the effects of an electrical stress on Organic Thin Film Transistors (OTFTs) properties. As an example, Channel Hot Carrier
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5d976302ec12703fd835551821512859
https://ddd.uab.cat/record/248842
https://ddd.uab.cat/record/248842
Publikováno v:
2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS).
In this work, the electrical properties of Metal-Insulator-Semiconductor devices with graphene intercalated between the HfO 2 dielectric and the gate electrode were studied at the nanometer scale (with a Conductive Atomic Force Microscope) and at dev
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 6, Pp 55-62 (2018)
Power consumption and Ion/Ioff ratio of an ultra-thin body and buried oxide fully depleted silicon on insulator CMOS inverter circuit has been calculated at near-threshold voltage operation from TCAD simulations. TCAD outputs (current, voltage, and c
Publikováno v:
Microelectronic Engineering. 178:66-70
In this work, a methodology to estimate ATLAS TCAD simulation parameters from experimental data is presented, with the aim of analyzing the impact of interface traps in the MOSFET threshold voltage variability of a particular technology. The method a