Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Marc Mikolajczak"'
Autor:
J. Decaunes, Maxime Gatefait, I. Smith, Alain Ostrovsky, Vincent Morin, Marc Mikolajczak, C. Monget, B. Le Gratiet, Nicolas Chojnowski, Auguste Lam, Z. Kocsis
Publikováno v:
SPIE Proceedings.
For C040 technology and below, photolithographic depth of focus control and dispersion improvement is essential to secure product functionality. Critical 193nm immersion layers present initial focus process windows close to machine control capability
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2dad83b74cf9d839c8d6c3419b4e33fc
https://doi.org/10.1117/12.2194746
https://doi.org/10.1117/12.2194746
Autor:
Alain Ostrovsky, C. Lapeyre, B. Le-Gratiet, Marc Mikolajczak, Auguste Lam, B. Orlando, Alice Pelletier, B. Beraud, J. Ducote, Maxime Gatefait, J. Decaunes, Frank Sundermann
Publikováno v:
SPIE Proceedings.
Advanced CMOS nodes require more and more information to get the wafer process well setup. Process tool intrinsic capabilities are not sufficient to secure specifications. APC systems (Advanced Process Control) are being developed in waferfab to mana
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::682b6014520efe724f992bfb4136227b
https://doi.org/10.1117/12.2064795
https://doi.org/10.1117/12.2064795
Autor:
Christophe Salagnon, Marc Mikolajczak, Joel Metz, Nicolas Chojnowski, R. Bouyssou, Alice Pelletier, Yoann Blancquaert, Frank Sundermann, Anna Phillips, Jean de Caunes, E. Batail, Thierry Devoivre, Bertrand Le Gratiet, Lionel Thevenon, Didier Gueze, Ahmed Oumina, Anne Strapazzon, Olivier Belmont, Jean Massin, Arthur Pelissier, E. Bernard, Marie-Pierre Baron, Benedicte Bry, Fabrice Bernard-Granger, Vincent Morin
Publikováno v:
SPIE Proceedings.
The main difficulty related to DoseMapper correction is to generate an appropriate CD datacollection to feed DoseMapper and to generate DoseRecipe in a user friendly way, especially with a complex process mix. We could heavily measure the silicon and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d089f02424e166e878645e3864d8d22d
https://doi.org/10.1117/12.911882
https://doi.org/10.1117/12.911882
Autor:
B. Le-Gratiet, R. Bouyssou, B. Orlando, Alice Pelletier, Céline Lapeyre, Latifa Desvoivres, Alain Ostrovsky, J. Ducote, Jean Damien Chapon, Auguste Lam, Anna Szucs, Nicolas Chojnowski, Vincent Farys, Onintza Ros Bengoechea, J. Decaunes, Jean-Christophe Michel, Vincent Morin, C. Monget, Marc Mikolajczak, Frank Sundermann, Maxime Gatefait, Pascal Gouraud, Laurene Babaud, Jonathan Planchot, Emek Yesilada
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 14:021103
Patterning process control has undergone major evolutions over the last few years. Critical dimension, focus, and overlay control require deep insight into process-variability understanding to be properly apprehended. Process setup is a complex engin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7ea7b96196431f517be1d881d144500
https://doi.org/10.1117/1.jmm.14.2.021103
https://doi.org/10.1117/1.jmm.14.2.021103
Autor:
Jan-Willem Gemmink, C. Monget, Marc Mikolajczak, Joost van Herk, Scott Warrick, Jean de Caunes, Bertrand Le Gratiet, Jean-Damien Chapon
Publikováno v:
SPIE Proceedings.
On-going complex integration schemes and developments in processes present significant challenges to lithography in manufacturing advanced semiconductor integrated circuits. Although APC solutions are in place to assist in achieving robust CD control
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6007824921ae2cb7963e8a0882d6dc66
https://doi.org/10.1117/12.657177
https://doi.org/10.1117/12.657177