Zobrazeno 1 - 10
of 74
pro vyhledávání: '"Marc A Verschuuren"'
Autor:
Unnar B Arnalds, Jonathan Chico, Henry Stopfel, Vassilios Kapaklis, Oliver Bärenbold, Marc A Verschuuren, Ulrike Wolff, Volker Neu, Anders Bergman, Björgvin Hjörvarsson
Publikováno v:
New Journal of Physics, Vol 18, Iss 2, p 023008 (2016)
We present a direct experimental investigation of the thermal ordering in an artificial analogue of an asymmetric two-dimensional Ising system composed of a rectangular array of nano-fabricated magnetostatically interacting islands. During fabricatio
Externí odkaz:
https://doaj.org/article/209aee2e1e334f6086dd57f2e8214912
Autor:
Erik Östman, Unnar B Arnalds, Emil Melander, Vassilios Kapaklis, Gunnar K Pálsson, Alexander Y Saw, Marc A Verschuuren, Florian Kronast, Evangelos Th Papaioannou, Charles S Fadley, Björgvin Hjörvarsson
Publikováno v:
New Journal of Physics, Vol 16, Iss 5, p 053002 (2014)
We demonstrate a lossless switching between vortex and collinear magnetic states in circular FePd disks arranged in a square lattice. Above a bifurcation temperature $\left( {{T}_{\text{e}}} \right)$ we show that thermal fluctuations are enough to fa
Externí odkaz:
https://doaj.org/article/efbcbf12e4a744a3b766d0a3a369ee61
Publikováno v:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e65d7ab71736ad404c31b039127664f7
https://doi.org/10.1117/12.2649342
https://doi.org/10.1117/12.2649342
Autor:
Marc A. Verschuuren
Publikováno v:
SPIE AR, VR, MR Industry Talks 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9010fff2b49b2e871dbd5cb83551e613
https://doi.org/10.1117/12.2632477
https://doi.org/10.1117/12.2632477
Autor:
Teun D G Nevels, Lieke J M Ruijs, Paul van de Meugheuvel, Marc A Verschuuren, Jaime Gómez Rivas, Mohammad Ramezani
Publikováno v:
Journal of Optics. 24:094002
Substrate conformal imprint lithography (SCIL) technology enables the fabrication of complex and non-trivial 3D nanostructures such a slanted gratings and metasurfaces with sub-10 nm resolution over large areas for industrial-scale production, which
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a880e8a3d3de36f040a56a6a59a1375b
https://doi.org/10.1088/2040-8986/ac7abe
https://doi.org/10.1088/2040-8986/ac7abe
Publikováno v:
Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) II.
Substrate Conformal Imprint Lithography (SCIL) solves the limitations of PDMS soft-stamp NIL techniques (resolution, pattern deformation, overlay) and allows low-pressure wafer scale conformal contact and sub-10 nm resolution using a novel silicone r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::76a491cda0a2a7c80ed69b249aa54186
https://doi.org/10.1117/12.2577298
https://doi.org/10.1117/12.2577298
Publikováno v:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIV.
Substrate Conformal Imprint Lithography (SCIL) solves the limitations of PDMS soft-stamp based NIL techniques (resolution, pattern deformation, overlay) and allows low-pressure wafer scale conformal contact and sub-10 nm resolution using a novel sili
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::939926ba6fd4cfcb4a00098f30652803
https://doi.org/10.1117/12.2577310
https://doi.org/10.1117/12.2577310
Publikováno v:
Novel Patterning Technologies 2021.
Substrate Conformal Imprint Lithography (SCIL) solves the limitations of PDMS soft-stamp based NIL techniques (resolution, pattern deformation, overlay) and allows low-pressure wafer scale conformal contact and sub-10 nm resolution using a novel sili
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8386466cb06793a5df2a2a56403559c1
https://doi.org/10.1117/12.2583654
https://doi.org/10.1117/12.2583654
Publikováno v:
Advanced Optical Technologies. 6:243-264
Releasing the potential of advanced material properties by controlled structuring materials on sub-100-nm length scales for applications such as integrated circuits, nano-photonics, (bio-)sensors, lasers, optical security, etc. requires new technolog
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3e9ed1da223cf0155feece7d4a81c7a9
https://doi.org/10.1515/aot-2017-0022
https://doi.org/10.1515/aot-2017-0022
Publikováno v:
Nanotechnology. 30(34)
We demonstrate a soft-imprint nanofabrication technique offering nanometer resolution over an area as large as a 150 mm diameter wafer. It makes use of a composite imprint stamp composed of a quaternary siloxane-modified poly-di-methyl-siloxane patte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d389aa0c596671ccc9d0bf5b8e42161f
https://pubmed.ncbi.nlm.nih.gov/31022703
https://pubmed.ncbi.nlm.nih.gov/31022703