Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Manuel Vorwerk"'
Autor:
Andreas Frangen, Manuel Vorwerk, Benjamin Alles, Eric Cotte, Frank Katzwinkel, Timo Wandel, Silvio Teuber, Gunter Antesberger
Publikováno v:
SPIE Proceedings.
In case drastic changes need to be made to tool configurations or blank specifications, it is important to know as early as possible under which conditions the tight image placement requirements of future lithography nodes can be achieved. Modeling,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::050f68c58d86a97a8d1e83b5edb36b2d
https://doi.org/10.1117/12.656373
https://doi.org/10.1117/12.656373
Autor:
Uwe Griesinger, David G Emery, Maciej W. Rudzinski, Mark J. Wihl, Manuel Vorwerk, Larry S. Zurbrick, Michel Prudhomme, Christian Dr. Crell, Mario Hennig
Publikováno v:
SPIE Proceedings.
Phase shifting mask technology will be necessary to product integrated circuits at the 130 nm node using KrF wavelength steppers. In order to successfully accomplish this goal, it is necessary to detect and repair phase shifting defects that may occu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1f1aaac51ebae3b628c26df8745950c5
https://doi.org/10.1117/12.425092
https://doi.org/10.1117/12.425092