Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Manuel Sellier"'
Autor:
Sachin Yadav, Yuye Kang, Manuel Sellier, Yida Li, Xiao Gong, Maheswari Sivan, Walter Schwarzenbach, Dian Lei, Christophe Maleville, Ludovic Ecarnot, Eugene Y.-J. Kong, Bich-Yen Nguyen, Aaron Thean
Publikováno v:
IEEE Transactions on Electron Devices. 66:2068-2074
Strained silicon-on-insulator (SSOI) is a promising platform for 5G, which will require both high-performance and low-power complementary metal–oxide–semiconductor (CMOS) devices. Hence, it is important to understand the behavior of strain in SSO
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e092b467acf8ab94b53c2c501125f713
https://doi.org/10.1109/ted.2019.2904313
https://doi.org/10.1109/ted.2019.2904313
Autor:
Manuel Sellier, Philippe Flatresse, Jamie Schaeffer, Bich-Yen Nguyen, Vincent Huart, Christophe Maleville, Franck Arnaud, S. Mhira, Olivier Weber
Publikováno v:
IEEE Solid-State Circuits Magazine. 10:24-33
Fully depleted silicon-on-insulator (FD-SOI) devices built on an ultrathin SOI layer on a buried-oxide (BOX) substrate feature unique performance capabilities and are suitable for full-range body biasing. FD-SOI technology has been adopted for multip
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2e936290eefa6752fcf214a376482e80
https://doi.org/10.1109/mssc.2018.2867405
https://doi.org/10.1109/mssc.2018.2867405
Publikováno v:
2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
This paper reports on recent advances in material innovation and substrate technologies enabling 5G. In particular, key requirements of 5G standards such as substrate linearity, power efficiency and RF/Analog performance are discussed. The characteri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::64b24e0fc56d2ff9ad111b2cdb6ce9d7
Autor:
Christophe Maleville, Manuel Sellier, Bich-Yen Nguyen, Walter Schwarzenbach, Christophe Girard
Publikováno v:
ICICDT
Multiples technology nodes in production are now based on FD-SOI thin film substrates. The development of these substrates has required several technical innovations (SmartCut process adaptation, new metrology introduction), which are discussed in th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f9fbaf2320619e87be5add77edfb5643
https://doi.org/10.1109/icicdt.2017.7993499
https://doi.org/10.1109/icicdt.2017.7993499
Autor:
Manuel Sellier
Publikováno v:
ECS Meeting Abstracts. :1455-1455
The main challenges of the semiconductor industry have long revolved around density scaling and performance improvement of ICs. However, a growing proportion of semiconductor consumption is now driven by factors other than pure performance and densit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::035ecef7453f826e1b09d7bafb1cb67d
https://doi.org/10.1149/ma2018-01/24/1455
https://doi.org/10.1149/ma2018-01/24/1455
Publikováno v:
Japanese Journal of Applied Physics. 47:3384-3389
In this work, we show how to use the model for assessment of CMOS technology and roadmaps (MASTAR) in order to generate ready-to-use simple pre-simulation program with integrated circuit emphasis (pre-SPICE) data. Calibration of MASTAR on silicon dat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::04dd928f1ca0bf495449f0211bdc1d6c
https://doi.org/10.1143/jjap.47.3384
https://doi.org/10.1143/jjap.47.3384
Autor:
Manuel Sellier
Publikováno v:
ECS Transactions
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5d1ca028850d0685c2ef3260fceefbd0