Zobrazeno 1 - 10
of 46
pro vyhledávání: '"Manohar Chirumamilla"'
Autor:
Manohar Chirumamilla, Tobias Krekeler, Deyong Wang, Peter K. Kristensen, Martin Ritter, Vladimir N. Popok, Kjeld Pedersen
Publikováno v:
Applied Nano, Vol 4, Iss 4, Pp 280-292 (2023)
Aluminum nitride (AlN) is a material of growing interest for power electronics, fabrication of sensors, micro-electromechanical systems, and piezoelectric generators. For the latter, the formation of nanowire arrays or nanostructured films is one of
Externí odkaz:
https://doaj.org/article/552eb898188f415880cf94eed5831845
Autor:
Anisha Chirumamilla, Maria H. Salazar, Deyong Wang, Peter K. Kristensen, Duncan S. Sutherland, Manohar Chirumamilla, Vladimir N. Popok, Kjeld Pedersen
Publikováno v:
Photonics, Vol 10, Iss 7, p 821 (2023)
A variety of nanostructures capable of generating strong local electromagnetic fields (hot spots) in interaction with radiation have been under intensive investigation towards plasmonic applications in surface-enhanced Raman scattering (SERS), biosen
Externí odkaz:
https://doaj.org/article/38736091b6db46b7aeb719bb025ce031
Autor:
Gnanavel Vaidhyanathan Krishnamurthy, Manohar Chirumamilla, Surya Snata Rout, Kaline P. Furlan, Tobias Krekeler, Martin Ritter, Hans-Werner Becker, Alexander Yu Petrov, Manfred Eich, Michael Störmer
Publikováno v:
Scientific Reports, Vol 11, Iss 1, Pp 1-12 (2021)
Abstract The high-temperature stability of thermal emitters is one of the critical properties of thermophotovoltaic (TPV) systems to obtain high radiative power and conversion efficiencies. W and HfO2 are ideal due to their high melting points and lo
Externí odkaz:
https://doaj.org/article/f68b42314a7c4beb906fa0046e953680
Autor:
Manohar Chirumamilla, Gnanavel Vaidhyanathan Krishnamurthy, Katrin Knopp, Tobias Krekeler, Matthias Graf, Dirk Jalas, Martin Ritter, Michael Störmer, Alexander Yu Petrov, Manfred Eich
Publikováno v:
Scientific Reports, Vol 9, Iss 1, Pp 1-11 (2019)
Abstract High temperature stable selective emitters can significantly increase efficiency and radiative power in thermophotovoltaic (TPV) systems. However, optical properties of structured emitters reported so far degrade at temperatures approaching
Externí odkaz:
https://doaj.org/article/065a0eaa0973406fb5364bc0a135153b
Publikováno v:
Popok, V, Chirumamilla, M, Krekeler, T, Ritter, M & Pedersen, K 2023, ' Magnetron Sputter Grown AlN Nanostructures with Giant Piezoelectric Response toward Energy Generation ', ACS Applied Nano Materials, vol. 6, no. 10, pp. 8849-8856 . https://doi.org/10.1021/acsanm.3c01250
Piezoelectric III-N semiconductor nanostructures are of increasing interest to be used for sensor technologies and energy harvesting. Within this group of materials, AlN is known for the largest bulk piezoelectric constant, but piezoelectric properti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::746d0c9155d4265e788482ccf3325ffa
https://doi.org/10.1021/acsanm.3c01250
https://doi.org/10.1021/acsanm.3c01250
Autor:
Anisha Chirumamilla, Ioana-Malina Moise, Ziru Cai, Fei Ding, Karina B. Jensen, Deyong Wang, Peter K. Kristensen, Lars R. Jensen, Peter Fojan, Vladimir Popok, Manohar Chirumamilla, Kjeld Pedersen
Publikováno v:
Chirumamilla, A, Moise, I M, Cai, Z, Ding, F, Jensen, K B, Wang, D, Kristensen, P K, Jensen, L R, Fojan, P, Popok, V, Chirumamilla, M & Pedersen, K 2023, ' Lithography-free fabrication of scalable 3D nanopillars as ultrasensitive SERS substrates ', Applied Materials Today, vol. 31, 101763 . https://doi.org/10.1016/j.apmt.2023.101763
Surface-enhanced Raman spectroscopy (SERS) detection of analyte molecules at ultra-low concentrations requires highly-efficient plasmonic nanostructures enabling a high hot-spot density. However, a facile and cost-effective strategy toward large-area
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b5da6d6afc7f20aa9ffa6ea2c5a7ee59
https://vbn.aau.dk/da/publications/88c90949-b1e3-415b-bc95-ba4aefeedfcb
https://vbn.aau.dk/da/publications/88c90949-b1e3-415b-bc95-ba4aefeedfcb
Autor:
Lin Jiang, Robert H. Blick, Andrew D. Abell, Robert Zierold, Siew Yee Lim, Manohar Chirumamilla, Cheryl Suwen Law, Carina Hedrich, Abel Santos
Publikováno v:
ACS Catalysis. 11:12947-12962
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bd7a5e4bff02b59e55a7f2d0cc5ea77e
https://doi.org/10.1021/acscatal.1c03320
https://doi.org/10.1021/acscatal.1c03320
Autor:
Mahima Arya, Ankita Ganguly, Gnanavel V. Krishnamurthy, Surya S. Rout, Leonid Gurevich, Tobias Krekeler, Martin Ritter, Kjeld Pedersen, Michael Störmer, Alexander Yu Petrov, Manfred Eich, Manohar Chirumamilla
Publikováno v:
Arya, M.; Ganguly, A.; Krishnamurthy, G.V.; Rout, S.S.; Gurevich, L.; Krekeler, T.; Ritter, M.; Pedersen, K.; Störmer, M.; Yu Petrov, A.; Eich, M.; Chirumamilla, M.: Which factor determines the optical losses in refractory tungsten thin films at high temperatures?. In: Applied Surface Science. Vol. 588 (2022) 152927. (DOI: /10.1016/j.apsusc.2022.152927)
Arya, M, Ganguly, A, Krishnamurthy, G V, Rout, S S, Gurevich, L, Krekeler, T, Ritter, M, Pedersen, K, Störmer, M, Yu Petrov, A, Eich, M & Chirumamilla, M 2022, ' Which factor determines the optical losses in refractory tungsten thin films at high temperatures? ', Applied Surface Science, vol. 588, 152927 . https://doi.org/10.1016/j.apsusc.2022.152927
Applied Surface Science 588: 152927 (2022-06-30)
Arya, M, Ganguly, A, Krishnamurthy, G V, Rout, S S, Gurevich, L, Krekeler, T, Ritter, M, Pedersen, K, Störmer, M, Yu Petrov, A, Eich, M & Chirumamilla, M 2022, ' Which factor determines the optical losses in refractory tungsten thin films at high temperatures? ', Applied Surface Science, vol. 588, 152927 . https://doi.org/10.1016/j.apsusc.2022.152927
Applied Surface Science 588: 152927 (2022-06-30)
Refractory tungsten (W) plays an important role in high temperature photonic/plasmonic applications. Previously room temperature bulk single/poly-crystalline optical constants were extensively used to calculate the optical properties of W nanostructu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::53b8081c88ff9f5ee2805437e3910524
https://publications.hereon.de/id/50516
https://publications.hereon.de/id/50516
Autor:
Martin Ritter, Duncan S. Sutherland, Gnanavel Vaidhyanathan Krishnamurthy, Alexander Petrov, Kjeld Møller Pedersen, S. S. Rout, Manohar Chirumamilla, Sergey I. Bozhevolnyi, Ankita Ganguly, Manfred Eich, Tobias Krekeler, Mahima Arya, Michael Störmer
Publikováno v:
Krekeler, T, Rout, S S, Krishnamurthy, G V, Störmer, M, Arya, M, Ganguly, A, Sutherland, D S, Bozhevolnyi, S I, Ritter, M, Pedersen, K, Petrov, A Y, Eich, M & Chirumamilla, M 2021, ' Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Krekeler, T.; Rout, S.S.; Krishnamurthy, G.V.; Störmer, M.; Arya, M.; Ganguly, A.; Sutherland, D.S.; Bozhevolnyi, S.I.; Ritter, M.; Pedersen, K.; Petrov, A.Y.; Eich, M.; Chirumamilla, M.: Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C. In: Advanced Optical Materials. Vol. 9 (2021) 16, 2100323. (DOI: /10.1002/adom.202100323)
Krekeler, T, S. Rout, S, V. Krishnamurthy, G, Störmer, M, Arya, M, Ganguly, A, S. Sutherland, D, i. Bozhevolnyi, S, Ritter, M, Pedersen, K, Yu Petrov, A, Eich, M & Chirumamilla, M 2021, ' Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Krekeler, T, Rout, S S, Krishnamurthy, G V, Störmer, M, Arya, M, Ganguly, A, Sutherland, D S, Bozhevolnyi, S I, Ritter, M, Pedersen, K, Petrov, A Y, Eich, M & Chirumamilla, M 2021, ' Unprecedented thermal stability of plasmonic titanium nitride films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Advanced Optical Materials 9 (16): 2100323 (2021-08-18)
Krekeler, T.; Rout, S.S.; Krishnamurthy, G.V.; Störmer, M.; Arya, M.; Ganguly, A.; Sutherland, D.S.; Bozhevolnyi, S.I.; Ritter, M.; Pedersen, K.; Petrov, A.Y.; Eich, M.; Chirumamilla, M.: Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C. In: Advanced Optical Materials. Vol. 9 (2021) 16, 2100323. (DOI: /10.1002/adom.202100323)
Krekeler, T, S. Rout, S, V. Krishnamurthy, G, Störmer, M, Arya, M, Ganguly, A, S. Sutherland, D, i. Bozhevolnyi, S, Ritter, M, Pedersen, K, Yu Petrov, A, Eich, M & Chirumamilla, M 2021, ' Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Krekeler, T, Rout, S S, Krishnamurthy, G V, Störmer, M, Arya, M, Ganguly, A, Sutherland, D S, Bozhevolnyi, S I, Ritter, M, Pedersen, K, Petrov, A Y, Eich, M & Chirumamilla, M 2021, ' Unprecedented thermal stability of plasmonic titanium nitride films up to 1400 °C ', Advanced Optical Materials, vol. 9, no. 16, 2100323 . https://doi.org/10.1002/adom.202100323
Advanced Optical Materials 9 (16): 2100323 (2021-08-18)
Titanium nitride (TiN) has emerged as one of the most promising refractory materials for plasmonic and photonic applications at high temperatures due to its prominent optical properties along with mechanical and thermal stability. From a high tempera
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c208d16046532acdfac723dc0550b1b7
https://hdl.handle.net/11420/10489
https://hdl.handle.net/11420/10489
Autor:
Gnanavel Vaidhyanathan Krishnamurthy, Michael Störmer, Mahima Arya, Alexander Yu. Petrov, Manohar Chirumamilla, S. S. Rout, Ankita Ganguly, Martin Ritter, Manfred Eich, Tobias Krekeler
Publikováno v:
Technische Universität Hamburg
We measure and compare the optical properties of thin refractory metal films (TiN, W, Mo and Ir) at temperatures up to 1000 °C. In-situ ellipsometry is used to measure the optical constants. Refractory metals show long-term structural stability at 1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::57cad1f2731bc7b0db2d27ac78502a2c
https://doi.org/10.1364/cleo_si.2021.stu1c.6
https://doi.org/10.1364/cleo_si.2021.stu1c.6